Buried triple-gate structures for advanced field-effect transistor devices

Autor: Müller, M.R., Gumprich, A., Schütte, F., Kallis, K., Künzelmann, U., Engels, S., Stampfer, C., Wilck, N., Knoch, J.

Publikováno v: In Microelectronic Engineering 1 May 2014 119:95-99

Contributors

Autor: Aida, H., Baisie, E.A., Boning, D., Borucki, L., Cook, Lee, Fan, W., Schumacher-Härtwig, H., Krishnan, M., Künzelmann, U., Lagudu, Uma Ramesh Krishna, Lee, Kangchun, Li, Z.C., Lofaro, M.F., Moon, Y., Nalaskowski, J., Ong, P., Paik, Ungyu, Park, Jin-Goo, Pate, K., Penta, N.K., Philipossian, A., Yerriboina, Nagendra Prasad, Papa Rao, S.S., Roy, Dipankar, Safier, P., Sampurno, Y., Seo, Jihoon, Song, Z., Speed, D.E., Teugels, L., Theng, S., Tseng, Wei-Tsu, Tsujimura, M., Wang, L., Zhang, Q., Zhang, X.H., Zwicker, G.

Publikováno v: In Advances in Chemical Mechanical Planarization (CMP) Edition: Second Edition. 2022:xi-xiii

Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid.

Autor: Kirchner R; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Neumann V; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Winkler F; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Strobel C; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Völkel S; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Hiess A; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Kazazis D; Paul Scherrer Institute, Laboratory for Micro- and Nanotechnology, Villigen, PSI 5232, Switzerland., Künzelmann U; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany., Bartha JW; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.

Publikováno v: Small (Weinheim an der Bergstrasse, Germany) [Small] 2020 Oct; Vol. 16 (43), pp. e2002290. Date of Electronic Publication: 2020 Oct 04.

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Charakterisierung dünner mit dem Laser-Arc abgeschiedener DLC-Schichten mit UV-VIS und IR-Spektroskopie

Autor: Drescher, D., Jäckel, R., Künzelmann, U., Scheibe, H.J.

The new deposition method with laser-induced controlled vacuum arc (Laser-Arc) was used for the thin film deposition of diamond-like carbon films on different materials (KBr, KCl, NaCl, ZnSe, KRS-5, Ge, c-Si and Corning 7059). The substrates were cle

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______610::becc0ff90858dec54a49b71ea75bad92
https://publica.fraunhofer.de/handle/publica/184303