Zobrazeno 1 - 1
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pro vyhledávání: '"Kévin Lepinay"'
Autor:
Ludovic Lattard, Kévin Lepinay, Jonathan Pradelles, Marco Jan-Jaco Wieland, Pieter Brandt, Bernard Dalzotto, Marie-Line Pourteau, Isabelle Servin, Cyrille Essomba
Publikováno v:
SPIE Proceedings.
The emerging Massively Parallel-Electron Beam Direct Write (MP-EBDW) is an attractive high resolution high throughput lithography technology. As previously shown, Chemically Amplified Resists (CARs) meet process/integration specifications in terms of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::700bdd04065bf3a9e3a883bb872ba31c
https://doi.org/10.1117/12.2218884
https://doi.org/10.1117/12.2218884
