Effect of Oxygen on the reactions in the Si/Ta/Cu metallization system

Autor: Kejun Zeng, Jorma K. Kivilahti, Tomi Laurila, Jyriki Molarius, Ilkka Suni

Publikováno v: Laurila, T, Zeng, K, Kivilahti, J, Molarius, J & Suni, I 2001, ' Effect of Oxygen on the reactions in the Si/Ta/Cu metallization system ', Journal of Materials Research, vol. 16, no. 10, pp. 2929-2946 . https://doi.org/10.1557/JMR.2001.0404

The effect of oxygen on the reaction mechanisms in the Si/Ta/Cu metallization system was studied experimentally and by utilizing the thermodynamically assessed Ta–O binary system. It was presented that an interfacial tantalum oxide was formed betwe

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::48b42f6dc062263fa47b4fc6ec2528ca
https://doi.org/10.1557/JMR.2001.0404