Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Jwam John Gielen"'
Publikováno v:
Journal of Physics D: Applied Physics, 37(14), 1917-1924. Institute of Physics
Due to cataphoresis, axial segregation of mercury will occur when the gas discharge of a fluorescent lamp is operated by means of a direct current. A consequence of this is a non-uniform axial luminance distribution along the lamp. To determine the d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dfe17278071b0f1d4f388a807145ed1a
https://doi.org/10.1088/0022-3727/37/14/006
https://doi.org/10.1088/0022-3727/37/14/006
Publikováno v:
Journal of Applied Physics, 82(5), 2643-2654. American Institute of Physics
A study on the effect of substrate conditions was performed for the plasma beam deposition of amorphous hydrogenated carbon ( a -C:H) from an expanding thermal argon/acetylene plasma on glass and crystalline silicon. A new substrate holder was design
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::73a61b4ac0eb4474148d8c7bbc592c59
https://doi.org/10.1063/1.366080
https://doi.org/10.1063/1.366080
Autor:
Rmj Roger Paffen, DC Daan Schram, RJ René Severens, Jwam John Gielen, van de Mcm Richard Sanden
Publikováno v:
Plasma Sources Science and Technology, 5(2), 268-274. Institute of Physics
This paper deals with the deposition of a-C:H and a-Si:H using the expanding thermal arc technique. The method is compared with other deposition techniques. The basics of the technique are explained and recent results on the deposition of high-qualit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::82fe95825c7d6afd355bd8b820f3c2db
https://research.tue.nl/en/publications/4d1708fb-4298-466d-8e47-387fa81f8552
https://research.tue.nl/en/publications/4d1708fb-4298-466d-8e47-387fa81f8552
Publikováno v:
Plasma Sources Science and Technology, 5(3), 492-498. Institute of Physics
An improved plasma beam deposition set-up, based on an expanding thermal plasma, is presented. Amorphous hydrogenated carbon films have been deposited on glass and crystalline silicon, under variation of the arc current and admixed acetylene flow. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::11a56f01110d389bc1dc90d105407b0b
https://research.tue.nl/en/publications/84b93e0f-8ca3-43f5-b79c-3c77e05ee336
https://research.tue.nl/en/publications/84b93e0f-8ca3-43f5-b79c-3c77e05ee336
Autor:
Rmj Roger Paffen, van de Mcm Richard Sanden, RJ René Severens, Jwam John Gielen, DC Daan Schram
Publikováno v:
Pure and Applied Chemistry, 68(5), 1155-1158. IUPAC Secretariat
The basic elements of expanding plasma beam deposition are explained. The principle of dissociation is discussed and illustrated for an Ar/C2H2 plasma. Recent results on high quality a-C:H deposition are discussed. It is demonstrated that quality is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::66a92c961dba96b460a03fc765ec747c
https://research.tue.nl/en/publications/98f7d634-7e88-4eff-a6bc-99c763c5d60b
https://research.tue.nl/en/publications/98f7d634-7e88-4eff-a6bc-99c763c5d60b
Publikováno v:
Thin Solid Films. 271:56-63
Amorphous fluorohydrogenated carbon layers are deposited on silicon and glass substrates using an expanding thermal arc plasma, burning on argon with a fixed flow (3 standard cm3 s- ‘) of acetylene and a varying flow (O-2.9 standard cm3 s- ‘) of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87d47d66d99468a74b512b63144e8d97
https://doi.org/10.1016/0040-6090(95)06902-x
https://doi.org/10.1016/0040-6090(95)06902-x
Autor:
RJ René Severens, Z Zhou Qing, DK Otorbaev, DC Daan Schram, Rah Richard Engeln, Rfg Ralph Meulenbroeks, van der Jjam Joost Mullen, de Mj Mark Graaf, van de Mcm Richard Sanden, Jwam John Gielen
Publikováno v:
Surface and Coatings Technology, 74-75(1-3), 1-9. Elsevier
The influence of wall-associated H 2 molecules and other hydrogen-containing monomers on the degree of ionization in the expanding thermal plasma used for the fast plasma beam deposition of amorphous hydrogenated carbon (a-C:H) and amorphous hydrogen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f9cdae1a04599521ee253200602fee05
https://doi.org/10.1016/0257-8972(95)08356-1
https://doi.org/10.1016/0257-8972(95)08356-1
Publikováno v:
Diamond and Related Materials, 4(7), 108-911. Elsevier
5th European Conference on Diamond, Diamond-like and Related Materials
5th European Conference on Diamond, Diamond-like and Related Materials
Absolute population densities of argon and atomic and molecular carbon are determined using the method of reabsorption in an expanding thermal arc plasma during the deposition of amorphous hydrogenated carbon (a-C:H) coatings. The reactor conditions
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::caf71881be34b166a62101f25d665241
https://research.tue.nl/en/publications/0c7e01c6-738b-40ed-992c-3f9a3eefb68a
https://research.tue.nl/en/publications/0c7e01c6-738b-40ed-992c-3f9a3eefb68a
Publikováno v:
Diamond and Related Materials, 4(4), 328-332. Elsevier
Applying an expanding cascaded arc thermal plasma beam deposition technique, amorphous fluorohydrogenated carbon (a-C:H,F) layers were deposited from acetylene (C 2 H 2 ) and tetrafluoromethane (CF 4 ). Deposition of the layers was monitored in situ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b2a78cd0aabbb51930273c5407cc26bb
https://doi.org/10.1016/0925-9635(94)05305-7
https://doi.org/10.1016/0925-9635(94)05305-7
Publikováno v:
Applied Physics Letters, 69(2), 152-154. American Institute of Physics
High quality diamondlike a‐C:H has been deposited, at low ion bombardment energies, from an expanding thermal argon/acetylene plasma at high growth rate. It is observed that quality improvement, in terms of hardness, is equivalent to maximization o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eba629deec39229844a0cb20db3f05eb
https://research.tue.nl/nl/publications/305b7ecf-a705-4afa-85e7-e06213fc7e53
https://research.tue.nl/nl/publications/305b7ecf-a705-4afa-85e7-e06213fc7e53
