Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Juyun Choi"'
Autor:
Choon Hwan Kim, Hyoungsub Kim, Seongheum Choi, Yunseok Kim, Eunjung Ko, Jinyong Kim, Minhyeong Lee, Sungkil Cho, Dae Hong Ko, Juyun Choi, Il Cheol Rho
Publikováno v:
Microelectronic Engineering. 165:1-5
As a future-generation source/drain contact structure, NiSi films were formed on a strained and epitaxial Si:P layer (P concentration of ~ 1.9 at.%), and their unique microstructural properties were characterized as a function of the annealing temper
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6952e08fb0177c1acd431de720420e48
https://doi.org/10.1016/j.mee.2016.08.003
https://doi.org/10.1016/j.mee.2016.08.003
Autor:
Hoo-Jeong Lee, Jun-gu Kang, Nam-Suk Lee, Chan Gyung Park, Sekwon Na, Hyoungsub Kim, Seok-Hee Lee, Juyun Choi
Publikováno v:
Acta Materialia. 92:1-7
In this study, we investigated the effects of Mo addition to Yb as a contact material with Si for metal–oxide-semiconductor field-effect transistors (MOSFETs) to mitigate oxidation problems, a persistent problem for rare-earth metal-based contacts
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::091cb8e1d33b606798ad1b16eac91136
https://doi.org/10.1016/j.actamat.2015.03.041
https://doi.org/10.1016/j.actamat.2015.03.041
Publikováno v:
physica status solidi (a). 212:775-779
Er-germanosilicide [Er(Si1−zGez)2−y] films were formed on strained Si1−xGex layers with different Ge contents (x = 0.14 and 0.28), and their dependency of formation kinetics on the Ge concentrations was investigated while minimizing the oxygen-
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c501299f79a99aecab88b232c512975
https://doi.org/10.1002/pssa.201431753
https://doi.org/10.1002/pssa.201431753
Autor:
Hyoungsub Kim, Seongheum Choi, Juyun Choi, Sekwon Na, Hoo Jeong Lee, Yu Seon Kang, Mann Ho Cho
Publikováno v:
ACS Applied Materials & Interfaces. 6:14712-14717
An ultrathin Ni interlayer (∼1 nm) was introduced between a TaN-capped Er film and a Si substrate to prevent the formation of surface defects during thermal Er silicidation. A nickel silicide interfacial layer formed at low temperatures and incurre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ad3756fa06b6683f6ac6d6fae2cecc4
https://doi.org/10.1021/am503626g
https://doi.org/10.1021/am503626g
Autor:
Juyun Choi, Hyoungsub Kim, Yujin Seo, Sekwon Na, Hwayoul Choi, Byunghoon Lee, Seok-Hee Lee, Hoo-Jeong Lee
Publikováno v:
Surface and Interface Analysis. 44:1497-1502
This article reports some new details of the Yb silicide formation mechanism. The combination of high-resolution transmission electron microscopy and energy dispersive spectroscopy helped us to unravel several interesting aspects of the silicidation
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::111a7e73fbe6af50a946889075e32215
https://doi.org/10.1002/sia.4985
https://doi.org/10.1002/sia.4985
Publikováno v:
International Journal of Pressure Vessels and Piping. 80:121-128
Pipelines have the highest capacity and are the safest and the least environmentally disruptive means for gas or oil transmission. Recently, failures due to corrosion defects have become of major concern in maintaining pipeline integrity. A number of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e3c762c19690940bafa551e42c8818fe
https://doi.org/10.1016/s0308-0161(03)00005-x
https://doi.org/10.1016/s0308-0161(03)00005-x
Autor:
Sang-Jin Hyun, Jae Jin Lee, Seok-Hee Lee, Hyoungsub Kim, Juyun Choi, Si-Young Choi, Yunsang Shin, Byung Jin Cho
Publikováno v:
physica status solidi (RRL) - Rapid Research Letters. 6:439-441
Trimethylaluminum pretreatment prior to HfO2 deposition is introduced for native oxide reduction. It is identified that the trimethylaluminum pretreatment could effectively reduce native oxide, which is transformed to an aluminum oxide interfacial la
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b4d0309929982f8c6ee35918bcb050e
https://doi.org/10.1002/pssr.201206315
https://doi.org/10.1002/pssr.201206315
Publikováno v:
Nuclear Engineering and Design. 214:73-81
In order to operate a reactor pressure vessel (RPV) safely, it is necessary to keep the pressure–temperature ( P – T ) limit during the heatup and cooldown process. While the ASME Code provides the P – T limit curve for safe operation, this lim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fdf97ff3ca23e46de4bbbb84fa4c69be
https://doi.org/10.1016/s0029-5493(02)00016-x
https://doi.org/10.1016/s0029-5493(02)00016-x
Publikováno v:
Nuclear Engineering and Design. 199:101-111
In general, reactor pressure vessels (RPV) are cladded with stainless steel to prevent corrosion and radiation embrittlement. The ASME Sec. XI specifies that a subclad crack which may be found during the in-service inspection must be considered as a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc93118fbab63d68df9aa4f52eefed3e
https://doi.org/10.1016/s0029-5493(99)00059-x
https://doi.org/10.1016/s0029-5493(99)00059-x
Autor:
Sekwon Na, Seok-Hee Lee, Seongheum Choi, Hoo-Jeong Lee, Hyoungsub Kim, Juyun Choi, Jungwoo Kim
Publikováno v:
ACS applied materialsinterfaces. 5(23)
The phase development and defect formation during the silicidation reaction of sputter-deposited Er films on Si with ∼20-nm-thick Ta and TaN capping layers were examined. TaN capping effectively prevented the oxygen incorporation from the annealing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7ac75677bce9e70b9954648f1c54f85f
https://pubmed.ncbi.nlm.nih.gov/24245709
https://pubmed.ncbi.nlm.nih.gov/24245709