Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Justin Waterman"'
Publikováno v:
2020 International Conference on Computational Science and Computational Intelligence (CSCI).
This project is considered the startup component of a framework for sensor data fusion, data mining, and analytics in real-time. The long-term goal is to build a dynamic, efficient, scalable, and secure runtime of parsing and handling multi-sensor da
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::faec1fb9b3a14a21607b2ae2e49ebf6d
https://doi.org/10.1109/csci51800.2020.00209
https://doi.org/10.1109/csci51800.2020.00209
Autor:
Frank Goodwin, Justin Waterman, Charles S. Tarrio, Obert R. Wood, Yu-Jen Fan, Chimaobi Mbanaso, Chiew-seng Koay, Andrew Aquila, Yayi Wei, Warren Montgomery, Gregory Denbeaux, Kevin Orvek, Leonid Yankulin, Eric M. Gullikson, Kim Dean, Saša Bajt, Rashi Garg, Steven E. Grantham, Alin Antohe, Andrea Wüest
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV) photoresists are known to outgas during exposure to EUV radiation in the vacuum environment. This is of particular concern since some of the outgassed species may contaminate the nearby EUV optics and cause a loss of reflect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::833bc668aad12432094c3387ae5d6d3e
https://doi.org/10.1117/12.772670
https://doi.org/10.1117/12.772670
Publikováno v:
SPIE Proceedings.
In order to continue the trend toward smaller feature sizes in lithography, new methods of lithography will be needed. A likely method for printing features 32 nm and smaller is extreme ultraviolet (EUV) lithography. EUV allows for features to be pri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b9a93859dacf5bd99d5f2fbd0785cb1
https://doi.org/10.1117/12.772701
https://doi.org/10.1117/12.772701
Publikováno v:
SPIE Proceedings.
Previous papers have reported on print-based methods used to measure the aberrations in the SEMATECH Berkeley EUV microfield exposure tool (MET). The data showed that the tool has larger aberrations than those measured during interferometry (both vis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ada18b3ade2bb89528ee9b66c6b4931
https://doi.org/10.1117/12.713448
https://doi.org/10.1117/12.713448
Autor:
Andrew K. Whittaker, Greg Denbeaux, Idriss Blakey, David J. Hill, Justin Waterman, Wang Yueh, Michael J. Leeson, Heping Liu, Kevin S. Jack, Heidi Cao
Publikováno v:
SPIE Proceedings.
We present the initial results of the development of a qualitative structure property relationship (QSPR) model to guide in the design and synthesis of high-sensitivity, non-CAR materials for EUV lithography. The model was developed using the fragmen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b6326d9b83e534e1d579fef4de7edfa
https://doi.org/10.1117/12.716213
https://doi.org/10.1117/12.716213
Autor:
Kim Dean, Molly Jaffe, Leonid Yankulin, Justin Waterman, Robert L. Brainard, Jeroen Netten, Alin Antohe, Chimaobi Mbanaso, Rashi Garg, Greg Denbeaux, Kevin DeMarco, Yu-Jen Fan, Matthew Waldron
Publikováno v:
23rd European Mask and Lithography Conference.
The Mo/Si multilayer mirrors used for extreme ultraviolet (EUV) lithography can become contaminated during exposure in the presence of some hydrocarbons [1-3]. Because this leads to a loss in the reflectivity of the optics and throughput of the expos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57f7e4fc8ef84e99c8988ec471152926
https://doi.org/10.1117/12.737192
https://doi.org/10.1117/12.737192