Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Justin K. Hanson"'
Autor:
Jens Reichelt, Jennifer Shumway, Nathan Neal, Robert Bonanni, Arjan Gijsbertsen, Sheldon Meyers, Justin K. Hanson, Young Ki Kim, Ferhad Kamalizadeh, Youri van Dommelen, Dionysios Petromanolakis
Publikováno v:
Optical Microlithography XXX.
With each technology node, overall focus budgets have become increasingly tighter in order to meet the necessary product requirements. The 7nm node has required us to define new opportunities for addressing top contributors to the focus budget. Field
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7b83a8aa47fd60a240c8f90c7af3469
https://doi.org/10.1117/12.2258391
https://doi.org/10.1117/12.2258391
Autor:
Justin K. Hanson, Ye Tian, Xueli Hao, Yen-Jen Chen, Ferhad Kamalizadeh, Juan-Manuel Gomez, Young Ki Kim
Publikováno v:
SPIE Proceedings.
As the demand of the technology node shrinks from 14nm to 7nm, the reliability of tool monitoring techniques in advanced semiconductor fabs to achieve high yield and quality becomes more critical. Tool health monitoring methods involve periodic sampl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1896a2e6b725d1dabbe84d3f3c7cf3a5
https://doi.org/10.1117/12.2258125
https://doi.org/10.1117/12.2258125
Autor:
Yen-Jen Chen, Shawn Lee, Xueli Hao, Ye Tian, Young Ki Kim, Justin K. Hanson, Ferhad Kamalizadeh, Juan-Manuel Gomez, Mark O. Mahoney, Pavan Samudrala
Publikováno v:
SPIE Proceedings.
With decreasing CDOF (Critical Depth Of Focus) for 20/14nm technology and beyond, focus errors are becoming increasingly critical for on-product performance. Current on product focus control techniques in high volume manufacturing are limited; It is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fe8819f6f6173a74d05fe789fed306c
https://doi.org/10.1117/12.2213019
https://doi.org/10.1117/12.2213019
Autor:
Maria Barkelid, Ye Tian, Roy Anunciado, Justin K. Hanson, Pavan Samudrala, Shawn Lee, Young Ki Kim, Juan-Manuel Gomez, Peter Nikolsky
Publikováno v:
SPIE Proceedings.
As leading edge lithography moves to advanced nodes, CDU requirements have relatively increased with technologies 14nm/20nm and beyond. In this paper, we want to introduce the methodology to offer an itemized CDU budget such as Intra-field, Inter-fie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbeb720cb17375bd6dd6630687a98215
https://doi.org/10.1117/12.2214123
https://doi.org/10.1117/12.2214123