Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Jurgen van Berkum"'
Autor:
Serban Dobroiu, Falco C.M.J.M. van Delft, Ayyappasamy Sudalaiyadum Perumal, Shantoshini Dash, Jenny Aveyard, Jeroen van Zijl, Jaap Snijder, Eric van den Heuvel, Jurgen van Berkum, Marie Pierre Blanchard, Cyril Favard, Dan V. Nicolau
Publikováno v:
ACS Sensors. 8:1882-1890
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0dc65fca847f3d0332caf817f87ea3b9
https://doi.org/10.1021/acssensors.2c01939
https://doi.org/10.1021/acssensors.2c01939
Autor:
Twan Boumans, Andrea Illiberi, Mirjam Theelen, Miro Zeman, Felix Stegeman, Zeger Vroon, Jurgen van Berkum, Nicolas Barreau, Fallon J. M. Colberts
Publikováno v:
Thin Solid Films, 550, 530-540. Elsevier
Thin Solid Films
Thin Solid Films, Elsevier, 2014, 550, pp.530. ⟨10.1016/j.tsf.2013.10.149⟩
Thin Solid Films, 550, 530-540
Thin Solid Films
Thin Solid Films, Elsevier, 2014, 550, pp.530. ⟨10.1016/j.tsf.2013.10.149⟩
Thin Solid Films, 550, 530-540
Sputtered aluminum doped zinc oxide (ZnO:Al) layers on borosilicate glass were exposed to damp heat (85 C/85% relative humidity) for 2876 h to accelerate the physical and chemical degradation behavior. The ZnO:Al samples were characterized by electri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::08af5ca592873a942d50c23782061897
https://doi.org/10.1016/j.tsf.2013.10.149
https://doi.org/10.1016/j.tsf.2013.10.149
Autor:
Miro Zeman, Melvin Verschuren, Arjan Hovestad, Zeger Vroon, Jurgen van Berkum, Sylvie Harel, Mirjam Theelen, M. Tomassini, Nicolas Barreau
Publikováno v:
Thin Solid Films
Thin Solid Films, Elsevier, 2016, 612, pp.381-392. ⟨10.1016/j.tsf.2016.06.028⟩
Thin Solid Films, Elsevier, 2016, 612, pp.381-392. ⟨10.1016/j.tsf.2016.06.028⟩
The degradation behavior of Mo/MoSe2 layers have been investigated using damp heat exposure. The two studied molybdenum based films with different densities and microstructures were obtained by lifting off Cu(In,Ga)Se2 layers froma bilayer molybdenum
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::258950c0a092c4159c805aee79107105
https://hal.archives-ouvertes.fr/hal-01723438
https://hal.archives-ouvertes.fr/hal-01723438
Autor:
Peter Stolk, Willem van de Wijgert, Jeroen van Zijl, Veerle Meyssen, Jurgen van Berkum, Giovanni Mannino, C.J.J. Dachs, N.E.B. Cowern, Richard Lindsay
Publikováno v:
Scopus-Elsevier
This paper studies the use of ion implantation and rapid thermal annealing for the fabrication of shallow junctions in sub-100 nm CMOS technology. Spike annealing recipes were optimized on the basis of delta-doping diffusion experiments and shallow j
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::443010e03fad81720c56f17fdc4e1a94
https://doi.org/10.1557/proc-669-j3.5
https://doi.org/10.1557/proc-669-j3.5
Autor:
Filadelfo Cristiano, H.G.A. Huizing, Giovanni Manninoo, Fred Roozeboom, Wiebe B. de Boer, Martín Jaraíz, Alain Claverie, Jurgen van Berkum, Peter Stolk, Nicholas E.B. Cowem
Publikováno v:
MRS Proceedings. 568
The ripening of ion-beam generated point defects into extended defects has been investigated in detail. The interstitial supersaturation has been extracted from boron marker-layer diffusion after annealing under non-equilibrium defect conditions. We
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a96e8acbf6c75a51087b94a837adc9a1
https://doi.org/10.1557/proc-568-163
https://doi.org/10.1557/proc-568-163
Autor:
Koray Karakaya, Beatriz Barcones, Andrei Zinine, Chris Rittersma, Peter Graat, Jurgen van Berkum, Marcel Verheijen, Guus Rijnders, Dave Blank
Publikováno v:
ECS Meeting Abstracts. :1133-1133
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64f1a94dfacd7366c3e3bd30512fc06a
https://doi.org/10.1149/ma2006-02/22/1133
https://doi.org/10.1149/ma2006-02/22/1133