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pro vyhledávání: '"Junhyuck Kwon"'
Autor:
Miso Kim, Junhyuck Kwon, Byungchul Cho, Byeong Guk Ko, Jiyong Kim, Chang Su Kim, Han-Bo-Ram Lee, Bonggeun Shong, Mohammad Rizwan Khan, Jin Sung Chun, Sumaira Yasmeen, Se-Hun Kwon, Kwangseon Jin, Hyun Gu Kim, Bonwook Gu
Publikováno v:
Chemistry of Materials. 32:8921-8929
Area-selective atomic layer deposition (AS-ALD) is a promising bottom-up patterning approach for fabricating conformal thin films. One of the current challenges with respect to AS-ALD is the defici...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a403082fd9bb1da5ff3f34c07e3bfe05
https://doi.org/10.1021/acs.chemmater.0c02798
https://doi.org/10.1021/acs.chemmater.0c02798
