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pro vyhledávání: '"Jungyoup Kim"'
Autor:
Jungyoup Kim
Publikováno v:
The Journal of Korea Real Estate Analysists Association. 22:77-88
Autor:
Jihoon Na, Donggun Lee, Jungyoup Kim, Chan-Uk Jeon, Hee-Bom Kim, Changhwan Do, Hong-seok Sim, Hwan-Seok Seo, Jung-Hwan Lee
Publikováno v:
SPIE Proceedings.
We introduce an extreme ultraviolet lithography (EUVL) mask defect review system (EMDRS) which has been developing in SAMUSNG. It applies a stand-alone high harmonic generation (HHG) EUV source as well as simple EUV optics consisting of a folding mir
Autor:
Lee Jae-Mo, Jungyoup Kim
Publikováno v:
Korean Journal of Gerontological Social Welfare. :7-30
Autor:
Seong-Sue Kim, Il-Yong Jang, Hyung-ho Ko, Byung-Gook Kim, Jungyoup Kim, Chan-Uk Jeon, Jaehyuck Choi, Hwan-Seok Seo, Soowan Koh, Su-Young Lee
Publikováno v:
SPIE Proceedings.
In EUV Lithography, an absence of promising candidate of EUV pellicle demands new requirements of EUV mask cleaning which satisfy the cleaning durability and removal efficiency of the various contaminations from accumulated EUV exposure. It is known
Autor:
Jungyoup Kim, Son, Neungsu
Publikováno v:
Journal of community welfare. 58:227
Publikováno v:
Journal of Minimally Invasive Gynecology. 15:88S