Zobrazeno 1 - 10
of 191
pro vyhledávání: '"Jungwoo Oh"'
Publikováno v:
Small Structures, Vol 4, Iss 8, Pp n/a-n/a (2023)
Mo2C is a promising non‐precious hydrogen evolution reaction (HER) electrocatalyst. However, regulating the strong hydrogen adsorption characteristics of Mo2C and finding suitable support electrodes are essential processes before Mo2C can replace P
Externí odkaz:
https://doaj.org/article/29efa05bc661484f86389757044dfe61
Publikováno v:
ACS Omega, Vol 2, Iss 5, Pp 2100-2105 (2017)
Externí odkaz:
https://doaj.org/article/dcd889c6306a4202a8305a42c435cf72
Publikováno v:
Applied Sciences, Vol 10, Iss 13, p 4519 (2020)
We propose a method for effectively utilizing weakly annotated image data in an object detection tasks of breast ultrasound images. Given the problem setting where a small, strongly annotated dataset and a large, weakly annotated dataset with no boun
Externí odkaz:
https://doaj.org/article/9b71367b0d464efb8b3cbd61e5d0fc6a
Publikováno v:
Results in Physics, Vol 10, Iss , Pp 248-249 (2018)
In this study, we have investigated the effects of SF6 plasma treatment on the isolation leakage current characteristics of AlGaN/GaN heterojunction field-effect transistors (HFETs). The device isolation was performed by Cl2/BCl3-based plasma etching
Externí odkaz:
https://doaj.org/article/3254bd2377704fa0a6acd58b88a79106
Publikováno v:
Small Structures. :2200283
Publikováno v:
SSRN Electronic Journal.
Publikováno v:
Nanoscale. 12:6411-6419
Direct machining and imprinting of Si are beneficial for simplifying the fabrication of microelectromechanical systems, nanoelectromechanical systems, optical devices, and fin field-effect transistors, and for reducing process costs. Electrochemical
Publikováno v:
ACS Nano. 13:13465-13473
Anodic imprint lithography patterns the GaAs substrate electrochemically by applying a voltage through a predefined anodic stamp. This newly devised technique performs anodic etching in a stamping manner. Stamps that serve as anodic electrodes are fa
Publikováno v:
Journal of Alloys and Compounds. 922:166197
Publikováno v:
Applied Surface Science. 600:154103