Zobrazeno 1 - 10
of 246
pro vyhledávání: '"Jungchul LEE"'
Autor:
Kibum Jung, Jungchul Lee
Publikováno v:
Micro and Nano Systems Letters, Vol 12, Iss 1, Pp 1-21 (2024)
Abstract Metal-Assisted Chemical Etching (MACE) is a technique for precisely forming nanostructures on semiconductor substrates, and it is actively researched in various fields such as electronic devices, optoelectronic devices, energy storage, and c
Externí odkaz:
https://doaj.org/article/e58a78c1d6b74de7b28592e8081d5102
Autor:
Kibum Jung, Jungchul Lee
Publikováno v:
Micro and Nano Systems Letters, Vol 12, Iss 1, Pp 1-7 (2024)
Abstract Atomic Force Microscopy (AFM) has intrinsic tip-sample convolution artifacts. Commercially available tip-check samples are used to obtain only the tip radius, which can be used to deconvolute surface profiles or to quantify tip wear by relyi
Externí odkaz:
https://doaj.org/article/cea9e8988ad7454688f43b34f71a025a
Autor:
Taeyeong Kim, Jungchul Lee
Publikováno v:
Micro and Nano Systems Letters, Vol 11, Iss 1, Pp 1-9 (2023)
Abstract Silicon nanoparticles have emerged as pivotal components in nanoscience and nanoengineering due to their inherent characteristics such as high energy capacity and outstanding optical properties. Numerous fabrication and characterization tech
Externí odkaz:
https://doaj.org/article/4aa83489e15b4f3e9580a2ded2066edd
Autor:
Taeyeong Kim, Jungchul Lee
Publikováno v:
Micro and Nano Systems Letters, Vol 11, Iss 1, Pp 1-11 (2023)
Abstract Silicon-on-insulator (SOI) wafers offer significant advantages for both Integrated circuits (ICs) and microelectromechanical systems (MEMS) devices with their buried oxide layer improving electrical isolation and etch stop function. For past
Externí odkaz:
https://doaj.org/article/21be9407775b41cf9474cde31ec25b13
Publikováno v:
Microsystems & Nanoengineering, Vol 9, Iss 1, Pp 1-8 (2023)
Abstract For simultaneous and quantitative thermophysical measurements of ultrasmall liquid volumes, we have recently developed and reported heated fluidic resonators (HFRs). In this paper, we improve the precision of HFRs in a vacuum by significantl
Externí odkaz:
https://doaj.org/article/10f3df20b689426797244c78195380dc
Publikováno v:
Micro and Nano Systems Letters, Vol 11, Iss 1, Pp 1-9 (2023)
Abstract Photopolymerization of hydrogels films has gained interest in many biomedical and industrial fields. Hydrogel micro-patterns fabricated directly on a device are used as filtering barriers, however, due to weak mechanical properties, these pa
Externí odkaz:
https://doaj.org/article/63f335ea1eec42ac8f9e985fe4858ee6
Autor:
Yongjin Na, Hyunsoo Kwak, Changmin Ahn, Seung Eon Lee, Woojin Lee, Chu-Shik Kang, Jungchul Lee, Junho Suh, Hongki Yoo, Jungwon Kim
Publikováno v:
Light: Science & Applications, Vol 12, Iss 1, Pp 1-10 (2023)
Ultrafast multidimensional imaging is made possible by the electro-optic sampling of arrival timings of multiple space-to-wavelength encoded light pulses.
Externí odkaz:
https://doaj.org/article/1b3a5793ce1e4eeb914980b0c1d7bde5
Publikováno v:
Micro and Nano Systems Letters, Vol 10, Iss 1, Pp 1-6 (2022)
Abstract Unique self-assembled germanium structures known as Germanium-on-Nothing (GON), which are fabricated via annealing, have buried multiscale cavities with different morphologies. Due to their unique sub-surface morphologies, GON structures are
Externí odkaz:
https://doaj.org/article/bd29c7e0016a4f68ada5810f509ee870
Autor:
Taeyeong Kim, Jungchul Lee
Publikováno v:
Micro and Nano Systems Letters, Vol 10, Iss 1, Pp 1-7 (2022)
Abstract During deep reactive ion etching (DRIE), microscale etch masks with small opening such as trenches or holes suffer from limited aspect ratio because diffusion of reactive ions and free radicals become progressively difficult as the number of
Externí odkaz:
https://doaj.org/article/e06ff36d4f0d49109ee8960248da9281
Publikováno v:
Micro and Nano Systems Letters, Vol 10, Iss 1, Pp 1-6 (2022)
Abstract We propose a scheme to establish a surrogate model for optimizing the annealing duration of the self-assembled membrane-cavity structures from hole patterned silicon wafers. Although it has been reported that the design space of post-anneali
Externí odkaz:
https://doaj.org/article/fe5df40c6ed242cdba1cfdb0ae689e2d