Zobrazeno 1 - 10
of 162
pro vyhledávání: '"Jung Il Park"'
Publikováno v:
Foods, Vol 13, Iss 19, p 3106 (2024)
This study investigates the growth characteristics of Salmonella enteritidis (S. enteritidis) in liquid whole egg under both isothermal and non-isothermal storage conditions to understand the risks associated with inadequate temperature management in
Externí odkaz:
https://doaj.org/article/48c6b09daa4248fda72edace37c4c855
Autor:
Bang-ock Kim
Publikováno v:
Journal of korean theatre studies association. :111-156
Autor:
Jun-Ha Hwang, A Rum Kim, Kyung Min Kim, Jung Il Park, Ho Taek Oh, Sung A Moon, Mi Ran Byun, Hana Jeong, Hyo Kyung Kim, Michael B. Yaffe, Eun Sook Hwang, Jeong-Ho Hong
Publikováno v:
Nature Communications, Vol 10, Iss 1, Pp 1-11 (2019)
Insulin resistance is associated with development of type 2 diabetes. Here the authors show that TAZ interacts with c-Jun and Tead4, inducing expression of the insulin receptor substrate 1 (IRS1) leading to increased glucose uptake in muscle, and tha
Externí odkaz:
https://doaj.org/article/14b73c8beec04ed68f0d0254de686c27
Publikováno v:
Journal of the Korean Cadastre Information Association. 25:119-130
Autor:
Jun-Ha Hwang, Dong-Hyun Lee, Mi Ran Byun, A. Rum Kim, Kyung Min Kim, Jung Il Park, Ho Taek Oh, Eun Sook Hwang, Kyu Back Lee, Jeong-Ho Hong
Publikováno v:
Scientific Reports, Vol 7, Iss 1, Pp 1-10 (2017)
Abstract The topographical environment, which mimics the stem cell niche, provides mechanical cues to regulate the differentiation of mesenchymal stem cells (MSC). Diverse topographical variations have been engineered to investigate cellular response
Externí odkaz:
https://doaj.org/article/f0a0b7b85efc4417a4ed3f10658eb992
Publikováno v:
Journal of the Korean Cadastre Information Association. 23:78-86
Autor:
Jung il Park
Publikováno v:
Journal of the Korean Cadastre Information Association. 23:28-41
Autor:
Jun-Ha Hwang, Woong Heo, Jung Il Park, Kyung Min Kim, Ho Taek Oh, Gi Don Yoo, Jeekeon Park, Somin Shin, Youjin Do, Mi Gyeong Jeong, Eun Sook Hwang, Jeong-Ho Hong
Publikováno v:
Theranostics; 2023, Vol. 13 Issue 12, p4182-4196, 15p
Autor:
Jung-Il Park
Publikováno v:
Applied Science and Convergence Technology. 29:82-86
Publikováno v:
2021 IEEE International Interconnect Technology Conference (IITC).
This paper describes an advanced 5nm node back-end-of-line (BEOL) process integration based on an extreme ultraviolet (EUV) lithography process, atomic layer deposition (ALD) barrier metal (BM) and Cu reflow process. The ALD BM technology was integra