Zobrazeno 1 - 10 of 82 pro vyhledávání: '"Jung Hyung Kim"'
1
Akademický článek
Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions
Autor: Ho Jin Ma, Seonghyeon Kim, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Jung-Hyung Kim, Hyo-Chang Lee, Young-Jo Park
Publikováno v: Scientific Reports, Vol 14, Iss 1, Pp 1-12 (2024)
Abstract In the semiconductor manufacturing process, when conducting inductively coupled plasma-reactive ion etching in challenging environments, both wafers and the ceramic components comprising the chamber’s interior can be influenced by plasma a
Externí odkaz: https://doaj.org/article/d936b4da80af4788a9e1ec14ad48873a
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3
Akademický článek
Evaluation of H2 Plasma-Induced Damage in Materials for EUV Lithography.
Autor: Eun-Seok Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, Hee-Jung Yeom, Min Young Yoon, Seongwan Hong, Dong-Wook Kim, Jung-Hyung Kim, Hyo-Chang Lee
Publikováno v: Advanced Materials Interfaces; 3/5/2024, Vol. 11 Issue 7, p1-9, 9p
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5
Analysis of the transmission spectrum of the microwave cutoff probe influenced by the sheath around the probe
Autor: H. J. Yeom, Young-Gi Kim, Gwang-Seok Chae, Do-Yeon Hwang, Jung-Hyung Kim, Hyo-Chang Lee
Publikováno v: Journal of Applied Physics. 133
We investigated the effect of the sheath around the probe tips on the transmission spectrum of a cutoff probe using an electromagnetic simulation and a circuit model. Our results show that the width of the sheath can change the transmission spectrum,
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b36bbb82f1aa6889ccc70f04fa64f0b9
https://doi.org/10.1063/5.0145958
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7
Akademický článek
Computational Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma: Ring- and Bar-Type Cutoff Probes
Autor: Si Jun Kim, Jang Jae Lee, Young Seok Lee, Hee Jung Yeom, Hyo Chang Lee, Jung-Hyung Kim, Shin Jae You
Publikováno v: Applied Sciences, Vol 10, Iss 20, p 7066 (2020)
The microwave planar cutoff probe, recently proposed by Kim et al. is designed to measure the cutoff frequency in a transmission (S21) spectrum. For real-time electron density measurement in plasma processing, three different types have been demonstr
Externí odkaz: https://doaj.org/article/f307b7f7fb924c2e9292686bc7075999
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8
Real-time monitoring of the plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor
Autor: H. J. Yeom, Min Young Yoon, Gwang-Seok Chae, Jung Hyung Kim, ShinJae You, Hyo-Chang Lee
Publikováno v: Applied Physics Letters. 122:114103
In the industrial semiconductor plasma processing, plasma density and its spatial distribution are critical for the understanding of discharge physics and the enhancement of the processing yield via monitoring of the status of plasma processing. Thus
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2bce7dcf8bbca3f03dc72314633794e9
https://doi.org/10.1063/5.0129790
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