Characterization of Flexible Low- k Dielectric SiCOH Films Prepared by Plasma-Enhanced Chemical Vapor Deposition of Tetrakis(trimethylsilyloxy)Silane Precursor.

Autor: Lee Y; Department of Physics, Sungkyunkwan University, Suwon-Si, Gyeonggi-Do, 16419, Republic of Korea., Ban W; Department of Physics, Sungkyunkwan University, Suwon-Si, Gyeonggi-Do, 16419, Republic of Korea., Jang S; Department of Mechanical Engineering, University of Louisiana at Lafayette, Lafayette, LA 70503, USA., Jung D; Department of Physics, Sungkyunkwan University, Suwon-Si, Gyeonggi-Do, 16419, Republic of Korea.

Publikováno v: Journal of nanoscience and nanotechnology [J Nanosci Nanotechnol] 2021 Apr 01; Vol. 21 (4), pp. 2139-2147.