Zobrazeno 1 - 10
of 26
pro vyhledávání: '"Jun-Chin Huang"'
Autor:
Jun-Chin Huang, 黃俊欽
95
With the progress of the semiconductor technology, the devices scaling down to submicron range leads to increase I/Os number and very fine pitch IC package type; such as BGA, Flip Chip and CSP type packages. For Flip chip packaging, the solde
With the progress of the semiconductor technology, the devices scaling down to submicron range leads to increase I/Os number and very fine pitch IC package type; such as BGA, Flip Chip and CSP type packages. For Flip chip packaging, the solde
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/twqy68
Autor:
Jun-Chin Huang, 黃俊欽
95
In this dissertation, we have successfully fabricated and investigated InAlAs/InGaAs high electron mobility transistors (HEMT’s) by employing different InxGa1-xAs channel designs and fabrication processes to improve the breakdown voltage an
In this dissertation, we have successfully fabricated and investigated InAlAs/InGaAs high electron mobility transistors (HEMT’s) by employing different InxGa1-xAs channel designs and fabrication processes to improve the breakdown voltage an
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/10810457555902033966
Autor:
Jun-Chin Huang, 黃俊欽
90
In this thesis, AlGaAs/InGaAs field-effect transistors using different indium content are fabricated. Furthermore, the □-doped layer effect on the device characteristics has been studied. A superlattice buffer inserted between channel and s
In this thesis, AlGaAs/InGaAs field-effect transistors using different indium content are fabricated. Furthermore, the □-doped layer effect on the device characteristics has been studied. A superlattice buffer inserted between channel and s
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/37689058924083034118
Publikováno v:
Semiconductor Science and Technology. 22:784-787
This study presents a metamorphic heterostructure field-effect transistor with a double δ-doped channel (MDDFET). The coupled δ-doped In0.5Ga0.5As/δ+/In0.5Ga0.5As/In0.6Ga0.4As/In0.5Ga0.5As/δ+/In0.5Ga0.5As channel demonstrates high carrier concent
Publikováno v:
Solid-State Electronics. 51:882-887
The enhancement-mode (E-mode) and depletion-mode (D-mode) device operations on the same chip and their monolithic integration to form a DCFL inverter by using the double δ-doped AlGaAs/InGaAs pseudomorphic high-electron-mobility transistors have bee
Publikováno v:
Semiconductor Science and Technology. 21:1675-1680
This work investigates the superior high-temperature and high-linearity characteristics of a double δ-doped AlGaAs/InxGa1−xAs/AlGaAs pseudomorphic high electron mobility transistor (pHEMT) with a symmetrically linearly graded InxGa1−xAs channel
Publikováno v:
Semiconductor Science and Technology. 21:619-625
Various static and microwave performances on InAlAs/InGaAs/InP HEMTs with a linearly-graded InxGa1−xAs channel (LGC-HEMT) have been comprehensively investigated and compared to those having a conventional lattice-matched In0.53Ga0.47As channel (LM-
Autor:
Wei-Chou Hsu, Tzong-Bin Wang, Yu-Shyan Lin, Jun-Chin Huang, Dong-Hai Huang, Ke-Hua Su, Ching-Hwa Ho
Publikováno v:
Semiconductor Science and Technology. 21:540-543
This investigation proposes the improved double δ-doped InGaP/InGaAs heterostructure field-effect transistor (HFET) grown by metalorganic chemical vapour deposition. The extrinsic transconductance (gm) and saturation current density (Imax) of the do
Publikováno v:
IEEE Transactions on Electron Devices. 53:406-412
This paper proposes a $hbox In_0.5hbox Al_0.5$ As/ $hbox In_xhbox Ga_1-xhbox As$break / $hbox In_0.5hbox Al_0.5hbox As$ $(x=0.3-0.5-0.3)$ metamorphic high-electron mobility transistor with tensile-strained channel. The tensile-strained channel struct
Thermal-Stable Characteristics of Metamorphic Double δ-Doped Heterostructure Field-Effect Transistor
Publikováno v:
Japanese Journal of Applied Physics. 46:6595-6597
In this study, we demonstrate the thermal-stable characteristics of a metamorphic double δ-doped heterostructure field-effect transistor (MDDFET). The variations in drain current density and extrinsic transconductance of the studied device are as lo