Zobrazeno 1 - 10
of 35
pro vyhledávání: '"Jun Sung Chun"'
Oxide Nanoparticle EUV (ONE) Photoresists: Current Understanding of the Unusual Patterning Mechanism
Autor:
Christopher K. Ober, Jun Sung Chun, Li Li, Jing Jiang, Mark Neisser, Mufei Yu, Ben Zhang, Emmanuel P. Giannelis
Publikováno v:
Journal of Photopolymer Science and Technology. 28:515-518
Autor:
Alin Antohe, Long He, Jun Sung Chun, Shih-Hui Jen, Frank Goodwin, Patrick A. Kearney, Mark Neisser
Publikováno v:
Journal of Photopolymer Science and Technology. 27:595-600
Publikováno v:
SPIE Proceedings.
We report the synthesis and characterization of novel block copolymer (BCP) materials for the directed self-assembly (DSA) nanolithography applications. Specifically, the poly(t-butyl acrylate) (PtBA) block in the styrenic block copolymers have been
Autor:
Warren Montgomery, Yu-Jen Fan, Jun Sung Chun, Cecilia A Montgomery, Scott McWilliams, Mac Mellish
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
EUV lithographers have continued to reduce the barriers to high Volume Manufacturing (HVM) introduction. Tool, mask and photoresist manufacturers have made excellent progress on several fronts, including resolution of many EUV source related issues,
Autor:
Clifford L. Henderson, Hannah Narcross, Brandon L. Sharp, Richard A. Lawson, Ashten Fralick, Mark Neisser, Laren M. Tolbert, Jun Sung Chun
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
A negative tone, aqueous base developable molecular glass resist, 3Ep, is presented that is developable in both standard organic solvents and aqueous base developers. The resist shows slightly better imaging performance in organic solvent versus aque
Autor:
Kevin Cummings, Vinayak Rastogi, Hiroie Matsumoto, Cecilia Montgomery, David Hetzer, Andrew Metz, Takashi Saito, Lior Huli, Warren Montgomery, Jun Sung Chun, Shih-Hui Jen, Yu-Jen Fan, Mark Neisser
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Recently there has been a great deal of effort focused on increasing EUV scanner source power; which is correlated to increased wafer throughput of production systems. Another way of increasing throughput would be to increase the photospeed of the ph
Autor:
Hannah Narcross, Jun Sung Chun, Richard A. Lawson, Clifford L. Henderson, Laren M. Tolbert, Brandon L. Sharp, Mark Neisser
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Many different types of non-traditional resist designs have shown promise for future generations of patterning, but there is a greater need for understanding and developing additives and ancillary materials for these novel resists compared to traditi
Autor:
Jun Sung Chun, Laren M. Tolbert, Clifford L. Henderson, Brandon L. Sharp, Mark Neisser, Hannah Narcross, Richard A. Lawson
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
A series of five negative tone epoxide functionalized molecu lar resists have been synthesized and have had their glass transition temperature ( e ) and lithographic contrast behavior characterized. Introducing rigid structural features in the form o
Autor:
Li Li, Emmanuel P. Giannelis, Ben Zhang, Christopher K. Ober, Jun Sung Chun, Jing Jiang, Mark Neisser
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
This work focuses on the investigation of dual tone patterning mechanism with hybri d inorganic/organic photoresist s. Hafnium oxide (HfO 2 ) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its part
Autor:
Nick Keller, Alain C. Diebold, Erik R. Hosler, Moshe Preil, Jun Sung Chun, Michael O’Sullivan, Joseph Race, M. Warren Montgomery, Dhairya Dixit
Publikováno v:
SPIE Proceedings.
Simulations of Mueller matrix spectroscopic ellipsometry (MMSE) based scatterometry are used to predict sensitivity to dimensional changes and defects in directed self-assembly (DSA) patterned contact hole structures fabricated with phase-separated p