Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jumpei Fukui"'
Publikováno v:
SPIE Proceedings.
It has been still highly required for cost efficient solution with easy operation for full-automated CD measurement for line width about 500nm up to 5μm on photomask, because it is frequently use such photomask in the process of manufacturing MEMS s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7578df222ebe678b008e3a934d800330
https://doi.org/10.1117/12.2278840
https://doi.org/10.1117/12.2278840
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Reducing time to market and cost-of-ownership is essential to MEMS makers. Therefore, lithography tools that continue to provide new, flexible, and versatile substrate alignment solutions, including backside alignment capabilities, are crucial factor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e47d4acf15def6e764a5809149b4707
https://doi.org/10.1109/asmc.2015.7164419
https://doi.org/10.1109/asmc.2015.7164419
Autor:
Jumpei Fukui, Volker Berghof, Shigeo Mizoroke, Tetsuji Onuki, Hamid R. Khorram, Makoto Osanai, Susumu Hagiwara
Publikováno v:
2012 SEMI Advanced Semiconductor Manufacturing Conference.
Similar to IC manufacturing, Cost of Ownership (CoO) and enhanced productivity are key focus areas for Microelectromechanical Systems (MEMS), Light Emitting Diodes (LED) and Air Bearing Surface (ABS) manufacturers. Here also, cost reduction can be ac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f99c7c535b5b0161fa632585d66fe2c
https://doi.org/10.1109/asmc.2012.6212919
https://doi.org/10.1109/asmc.2012.6212919