Zobrazeno 1 - 10
of 41
pro vyhledávání: '"Julius Hållstedt"'
Autor:
Julius Hållstedt, Emil Espes
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 78:a62-a62
Autor:
Julius Hållstedt, E. Espes
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 77:C774-C774
Autor:
Anasuya Adibhatla, Julius Hållstedt
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 77:a5-a5
Publikováno v:
Microscopy and Microanalysis. 26:1572-1572
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Front end X-ray metrology applications based on diffraction, scattering or fluorescence such as HRXRD, XRR, CD-SAXS or μXRF rely heavily on the x-ray source brightness for metrology throughput and accuracy. Similarly, high end X-ray imaging applicat
Autor:
Tomi Tuohimaa, Anasuya Adibhatla, Fei Yang, Ulf Lundström, Julius Hållstedt, Mikael Otendal, Daniel H. Larsson
Publikováno v:
Microscopy and Microanalysis. 24:318-319
Autor:
Emil Espes, Julius Hållstedt
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 75:e632-e632
Autor:
Julius Hållstedt, Emil Espes
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 75:e28-e28
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 75:a39-a39
Autor:
Tomi Tuohimaa, Anasuya Adibhatla, Per Takman, Julius Hållstedt, Ulf Lundström, Oscar Hemberg, Mikael Otendal
Publikováno v:
Acta Crystallographica Section A Foundations and Advances. 75:a27-a27