Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Juliet Rubinstein"'
Autor:
Abde Kaqalwalla, Nuo Xu, Lynn T.-N. Wang, Puneet Gupta, Costas J. Spanos, Tiehui Liu, Tuck-Boon Chan, Kwangok Jeong, Kameshwar Poolla, Kenji Yamazoe, Anand Subramanian, Xin Sun, Justin Ghan, Marshal A. Miller, Andrew R. Neureuther, Kun Qian, Eric Y. Chin, Cooper S. Levy, Rani S. Ghaida, Juliet Rubinstein
Publikováno v:
SPIE Proceedings.
Techniques for identifying and mitigating effects of process variation on the electrical performance of integrated circuits are described. These results are from multi-discipline, collaborative university-industry research and emphasize anticipating
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81967e29b61c1e8cd2b8d48d38b7bffa
https://doi.org/10.1117/12.899394
https://doi.org/10.1117/12.899394
Publikováno v:
SPIE Proceedings.
A fast-CAD method for evaluating through-focus interaction among features is developed based on dual layout convolution kernels derived and tested for accuracy in predicting intensity changes. The model is derived by extending the Taylor series expan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8865e090a0bdb554998b1f2d1497489d
https://doi.org/10.1117/12.814190
https://doi.org/10.1117/12.814190
Publikováno v:
SPIE Proceedings.
A tiny footprint electrically probable single layer defocus monitor/test structure has been designed and tested to show sub-10nm resolution in electrical or electronic defocus monitoring. Electronic testing is a low-cost must have for on-chip product
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e58bcb8aa03c94b5b5d231933f88851
https://doi.org/10.1117/12.814448
https://doi.org/10.1117/12.814448
Publikováno v:
Optical Microlithography XXI.
Pattern matching methods are examined as fast-CAD tools for full-chip across process window examination of postdecomposition double patterning layouts. The goal is to demonstrate the ability to anticipate lithographic weakness due to many sources. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6be1fe13d5ac8903b2d410293bcf4256
https://doi.org/10.1117/12.772891
https://doi.org/10.1117/12.772891
Publikováno v:
SPIE Proceedings.
An experimental technique for quantitatively characterizing edge effect contributions in transmission through thick photomasks is described and evaluated through electromagnetic simulation. The technique consists of comparing the 0 th order transmiss
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b6e730e1600372051e182fd4b253dfc0
https://doi.org/10.1117/12.746805
https://doi.org/10.1117/12.746805
Publikováno v:
SPIE Proceedings.
Self-interferometric electrically measurable image focus monitors have been designed and tested in photoresist in a double exposure implementation. The Pattern-and-Probe monitors for this experiment were placed on a multiple student phase shift mask,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80a086b20fdd2460a729e44cd59a3ad4
https://doi.org/10.1117/12.746728
https://doi.org/10.1117/12.746728
Autor:
Eric Y. Chin, Andrew R. Neureuther, Juliet Rubinstein, Marshal A. Miller, Lynn T.-N. Wang, Chris Clifford, Kenji Yamazoe
Publikováno v:
Japanese Journal of Applied Physics. 49:06GA01
Key physical phenomena associated with resists, illumination, lenses and masks are used to show the progress in models and algorithms for modeling optical projection printing as well as current simulation challenges in managing process complexity for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::65a1988706a0330a46bf50c52fbcdd20
https://doi.org/10.1143/jjap.49.06ga01
https://doi.org/10.1143/jjap.49.06ga01