Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Juan J. Faria-Briceno"'
Autor:
Ruichao Zhu, Juan J. Faria-Briceno, S. R. J. Brueck, Praveen Joseph, Shrawan Singhal, S. V. Sreenivasan
Publikováno v:
AIP Advances, Vol 10, Iss 1, Pp 015140-015140-10 (2020)
Angular scatterometry is a fast, in-line, noncontact, and nondestructive nanoscale metrology tool that is widely used in manufacturing processes. As scatterometry is a potential metrology technique for next generation semiconductor manufacturing and
Externí odkaz:
https://doaj.org/article/8bd69f33688e4df183aca66878d6995f
Autor:
Steven R. J. Brueck, Vineeth Sasidharan, Juan J. Faria-Briceno, Shrawan Singhal, Sidlgata V. Sreenivasan, Alexander Neumann
Publikováno v:
Novel Patterning Technologies 2021.
Roll-to-roll and other high-speed printing manufacturing processes are increasingly being extended to micro- and nano-electronics and photonics due to cost and throughput advantages as compared with traditional wafer-scale manufacturing. The extra de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b8ba399edfa7f78231906a52d58bd45
https://doi.org/10.1117/12.2593730
https://doi.org/10.1117/12.2593730
Publikováno v:
Scientific Reports
Scientific Reports, Vol 9, Iss 1, Pp 1-9 (2019)
Scientific Reports, Vol 9, Iss 1, Pp 1-9 (2019)
This communication reports liquid wetting properties of DI-water on one-dimensional nano-patterned photoresist lines atop a silicon substrate as the pattern period is varied from 0.3- to 1.0-µm. Both constant photoresist height and constant width/he
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c9310a1c0e9bcdbe63342f878579e51b
https://doi.org/10.1038/s41598-019-42106-z
https://doi.org/10.1038/s41598-019-42106-z
Autor:
Shrawan Singhal, Juan J. Faria-Briceno, Ruichao Zhu, Sidlgata V. Sreenivasan, S. R. J. Brueck, Praveen Joseph
Publikováno v:
AIP Advances, Vol 10, Iss 1, Pp 015140-015140-10 (2020)
Angular scatterometry is a fast, in-line, noncontact, and nondestructive nanoscale metrology tool that is widely used in manufacturing processes. As scatterometry is a potential metrology technique for next generation semiconductor manufacturing and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3bdf412eb960f005788976c35966142f
https://doaj.org/article/8bd69f33688e4df183aca66878d6995f
https://doaj.org/article/8bd69f33688e4df183aca66878d6995f
Publikováno v:
Journal of Vacuum Science & Technology B. 37:051806
This paper reports the wetting properties and spatially dependent etch rate variation on the interaction of a dilute potassium hydroxide (KOH):water droplet with a nanopatterned one-dimensional, 500-nm period, grooved photoresist surface. The KOH liq
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d31fee23e04a25538a88b2158011b993
https://doi.org/10.1116/1.5116703
https://doi.org/10.1116/1.5116703
Autor:
Vineeth Sasidharan, Shrawan Singhal, S. R. J. Brueck, Sidlgata V. Sreenivasan, Ruichao Zhu, Alexander Neumann, Juan J. Faria-Briceno
Publikováno v:
Journal of Vacuum Science & Technology B. 37:052904
Metrology is an essential aspect of nanomanufacturing. Increasingly, nanoscale three-dimensional features are demanded for advanced applications, increasing the demands on metrology. New fabrication techniques such as roll-to-roll (R2R) processes are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93de061fd91c3f90aa34ec112d10a72b
https://doi.org/10.1116/1.5119707
https://doi.org/10.1116/1.5119707