Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Joyce Lowes"'
Autor:
Si Li, Joyce Lowes, Ruimeng Zhang, Ming Luo, Kelsey Brakensiek, Veerle van Driessche, Douglas J. Guerrero
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::010de2d544ac21bfcf91f76eee063a2a
https://doi.org/10.1117/12.2658529
https://doi.org/10.1117/12.2658529
Autor:
Yichen Liang, Kelsey E. Brakensiek, Joyce Lowes, Andrea M. Chacko, Ruimeng Zhang, Veerle Van Driessche, Xiaolong Lang, Jaishankar Kasthuri, Ming Luo, Douglas J. Guerrero
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::233f3ac6832d7fce4b9df032b6b36420
https://doi.org/10.1117/12.2610985
https://doi.org/10.1117/12.2610985
Autor:
Zhiqiang Fan, Zhimin Zhu, Tim Limmer, Srikanth Kommu, Xianggui (Shawn) Ye, Joyce Lowes, Richard Daugherty, James Lamb
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Silicon hardmask (Si-HM) materials used in lithography processes play a critical role in transferring patterns to desired substrates. In addition, these materials allow for the tuning of optical properties such as reflectivity and optical distributio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::87e198f8f726c53499e51d3b0992d461
https://doi.org/10.1117/12.2552929
https://doi.org/10.1117/12.2552929
Publikováno v:
Optical Microlithography XXXIII.
Measuring properties of ultrathin optical films is based on optical interference. Ultrathin films are very challenging to test, because their thicknesses are far smaller than the measuring wavelength, so very little phase shift can be detected. In th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e2b506576cfabdfc2e92bde2b3308e8
https://doi.org/10.1117/12.2551934
https://doi.org/10.1117/12.2551934
Autor:
Nickolas L. Brakensiek, Joyce Lowes, Amanda G. Riojas, Daniel M. Sullivan, Zhimin Zhu, Trisha May
Publikováno v:
Optical Microlithography XXX.
Figure would be provided Figure 1 shows that the most important factor in lithography is foot contrast. Low contrast leaves a large region (CAT) where resist solubility is uncertain (chaotic area), which causes unresolvable patterns, LER/LWR issues,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cfb138371e00a6f1ae5931aa83cf577
https://doi.org/10.1117/12.2257363
https://doi.org/10.1117/12.2257363
Publikováno v:
ECS Transactions. 60:293-302
This paper presents a theory to explain how detectable defects are generated during a material’s transition from a liquid state into a solid film. The hypothesis of defect formation is that it occurs as a result of an imbalance of molecular forces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::deca383979ed2cb173670f52924395a5
https://doi.org/10.1149/06001.0293ecst
https://doi.org/10.1149/06001.0293ecst
Publikováno v:
2016 China Semiconductor Technology International Conference (CSTIC).
It is well known that patterning materials are sensitive to many factors that determine lithography performance. For example, when the same resist is used with various underlayers optimized to the same optical distribution, the different underlayers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c237d3b062e770090ad1098e5a3ee536
https://doi.org/10.1109/cstic.2016.7463971
https://doi.org/10.1109/cstic.2016.7463971
Publikováno v:
ECS Transactions. 34:249-255
Almost a decade ago, the integrated circuit (IC) industry realized that traditional implant layers required new technology to achieve the specifications of the shrinking design rules and increased topography effects. In response, developer-soluble bo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0daf9e6e19d03ef213cdfca9180b60de
https://doi.org/10.1149/1.3567589
https://doi.org/10.1149/1.3567589
Publikováno v:
Journal of Photopolymer Science and Technology. 20:339-343
Organic materials are routinely coated on semiconductor substrates for various photolithographic processes. The cleanliness of a substrate after being coated with a bottom anti-reflective coating (BARC), photoresist, or both was studied using contact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ab305ff5c9cbf35ea64789f924dcfca
https://doi.org/10.2494/photopolymer.20.339
https://doi.org/10.2494/photopolymer.20.339
Publikováno v:
2015 China Semiconductor Technology International Conference.
Of primary importance in lithography is understanding internal molecular forces, characterized by chemical contrast, which, when uncontrolled, can lead to pattern uncertainty and line edge roughness/line width roughness (LER/LWR). Another key to achi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::98b20f43c24f335f59a4f047abba4a83
https://doi.org/10.1109/cstic.2015.7153341
https://doi.org/10.1109/cstic.2015.7153341