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pro vyhledávání: '"Jowan Jacobs"'
Autor:
Eelco van Setten, Christian Wagner, Richard Droste, Tilmann Heil, Leon Martin Levasier, Louis Jorritsma, Jos de Klerk, Jowan Jacobs, Hans Kattouw
Publikováno v:
SPIE Proceedings.
Water based immersion lithography is now widely recognized a key enabler for continued device shrinks beyond the limits of classical dry lithography. Since 2004, ASML has shipped multiple TWINSCAN immersion systems to IC manufacturers, which have fac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c4d4d10ec6c2987b7b5163b12ddecd2
https://doi.org/10.1117/12.712094
https://doi.org/10.1117/12.712094
