Zobrazeno 1 - 10
of 47
pro vyhledávání: '"Jovica Ivkov"'
Publikováno v:
Metals and Materials International. 25:1227-1234
Some of mechanical, electrical, and thermal properties of the Al–(Nb, Mo, Ta, W) binary thin films which are important for the stability and usability of the amorphous alloys were examined. Samples were prepared by magnetron deposition technique in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::24d1cc156022f34c45c9225c7fea5c15
https://doi.org/10.1007/s12540-019-00271-w
https://doi.org/10.1007/s12540-019-00271-w
Publikováno v:
Journal of Alloys and Compounds. 621:136-145
A comprehensive study of selected properties of amorphous (a) Cu-TE alloys (TE=Ti, Zr and Hf) has been performed. Data for average atomic volumes of a- Cu-Hf, Ti alloys combined with literature data show that ideal solution behaviour (Vegard`s law) e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::abcfd8d75f50c3a9dcdb235382e7caa9
https://doi.org/10.1016/j.jallcom.2014.09.167
https://doi.org/10.1016/j.jallcom.2014.09.167
Publikováno v:
Vacuum. 98:75-80
Structural relaxation and crystallization of Al-(Nb, Mo, Ta, W) amorphous thin films under isochronal condition were examined by continuous in situ electrical resistance measurements in vacuum. The amorphous Al-early transition metals (TE) thin films
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5685f37d9fd988732b1545d71ad21b99
https://doi.org/10.1016/j.vacuum.2012.09.008
https://doi.org/10.1016/j.vacuum.2012.09.008
Autor:
Denis Stanić, Birgitta Bauer, Peter Gille, Petar Popčević, Ana Smontara, Janez Dolinšek, Jovica Ivkov
Publikováno v:
Philosophical Magazine. 91:2739-2745
The Hall coefficient RH in monoclinic Y-Al-Ni-Co, orthorhombic Al13Co4 and monoclinic Al13Fe4 and Al13(Fe, Ni)4 single crystals has been investigated for all combinations of the electrical current and magnetic field directions and in the temperature
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c18c016234f17a9210244a285fa9800a
https://doi.org/10.1080/14786435.2010.509053
https://doi.org/10.1080/14786435.2010.509053
Publikováno v:
Solid State Communications. 149:515-518
We present an experimental and theoretical study of the anisotropic Hall coefficient R H of the Y–Al–Ni–Co periodic approximant to the decagonal phase with composition Al76Co22Ni2. Performing ab-initio calculation of R H for the original Y–Al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::529a23a4a022ecbc7f3d14b0b1d95563
https://doi.org/10.1016/j.ssc.2009.01.013
https://doi.org/10.1016/j.ssc.2009.01.013
Thin Al x Mo 100− x films (40 ≤ x ≤ 90 with x in steps of 5 at % Al) were prepared by magnetron co-deposition onto alumina, glass, and saphire substrates at room temperature. The film thickness was about 400 nm, and they were amorphous for 45
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7122c23bf23404978afbbde6516d51bf
https://doi.org/10.1016/j.jallcom.2015.06.022
https://doi.org/10.1016/j.jallcom.2015.06.022
Publikováno v:
Solid State Communications. 129:369-373
The Hall coefficient, RH, electrical resistivity, ρ, and temperature coefficient of resistivity, α, of AlxW100−x (61≤x≤88) thin films and amorphous-like tungsten films are reported. The AlxW100−x films have been prepared by magnetron co-dep
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e2cd4290d49362fb0dda88edd732914e
https://doi.org/10.1016/j.ssc.2003.11.002
https://doi.org/10.1016/j.ssc.2003.11.002
Autor:
Jovica Ivkov, Marc Armbrüster, P. Koželj, Peter Gille, M. Hahne, Silke Paschen, Stefan Jurga, P. Tomeš, J. Dolinšek, Ana Smontara, A. Kocjan, S. Vrtnik, Petar Popčević, Magdalena Wencka, Y. Grin, Zvonko Jagličić, Marija Sorić, D. Korže, Alim Ormeci
The intermetallic phase InPd is a candidate material for the use as a catalyst in the methanol steam reforming process. To study the connection between the catalytic properties of the surface and the structural and electronic properties of the bulk,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a9311154cff65f9fe17e0008a4c4d9a8
https://www.bib.irb.hr/656567
https://www.bib.irb.hr/656567
Publikováno v:
Applied Physics A: Materials Science & Processing. 68:69-73
Crystallization kinetics of the amorphous Al-W thin films under non-isothermal conditions was examined by continuous in situ electrical resistance measurements in vacuum. The estimated crystallization temperature of amorphous films in the composition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e6b095489a7c3befa614c54125ecbfb3
https://doi.org/10.1007/s003390050855
https://doi.org/10.1007/s003390050855
Publikováno v:
Thin Solid Films. 320:192-197
Tungsten-carbon thin films have been deposited by reactive (Ar + C6H6) DC magnetron sputtering onto various substrates. Deposition onto glass, monocrystalline silicon, tantalum and stainless steel at room temperature yielded W–C films, having XRD p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::665a77d371933ec4dfc5e08360a0b8b2
https://doi.org/10.1016/s0040-6090(97)00758-x
https://doi.org/10.1016/s0040-6090(97)00758-x