Zobrazeno 1 - 10
of 91
pro vyhledávání: '"Joung Ho Lee"'
Autor:
So-Won Kim, Jae-Hoon Yoo, Won-Ji Park, Chan-Hee Lee, Joung-Ho Lee, Jong-Hwan Kim, Sae-Hoon Uhm, Hee-Chul Lee
Publikováno v:
Nanomaterials, Vol 14, Iss 20, p 1686 (2024)
We aimed to fabricate reliable memory devices using HfO2, which is gaining attention as a charge-trapping layer material for next-generation NAND flash memory. To this end, a new atomic layer deposition process using sequential remote plasma (RP) and
Externí odkaz:
https://doaj.org/article/a009560ee3c94ae9b861118dcb7fa76d
Publikováno v:
Materials, Vol 16, Iss 14, p 5112 (2023)
To develop plasma-resistant glass materials suitable for semiconductor etching processes, we introduced alkaline earth oxides (ROs) into a Li2O–Al2O3–SiO2 (LAS) glass. Analysis of glass properties with respect to the additives revealed that among
Externí odkaz:
https://doaj.org/article/4520f6e799664cc28ed7e3b847a32b7d
Autor:
Jae-Hoon Yoo, Won-Ji Park, So-Won Kim, Ga-Ram Lee, Jong-Hwan Kim, Joung-Ho Lee, Sae-Hoon Uhm, Hee-Chul Lee
Publikováno v:
Nanomaterials, Vol 13, Iss 11, p 1785 (2023)
Optimization of equipment structure and process conditions is essential to obtain thin films with the required properties, such as film thickness, trapped charge density, leakage current, and memory characteristics, that ensure reliability of the cor
Externí odkaz:
https://doaj.org/article/ecb51cbfc56243eeb19deecf206f81ed
Autor:
Muhammad Irfan Siddique, Joung-Ho Lee, Jung-Hwan Ahn, Meirina Kartika Kusumawardhani, Ramadhani Safitri, Asep Harpenas, Jin-Kyung Kwon, Byoung-Cheorl Kang
Publikováno v:
PLoS ONE, Vol 17, Iss 2 (2022)
Disease caused by Pepper yellow leaf curl virus (PepYLCV) is one of the greatest threats to pepper (Capsicum spp.) cultivation in the tropics and subtropics. Resistance to PepYLCV was previously identified in a few Capsicum accessions, but no resista
Externí odkaz:
https://doaj.org/article/305a08bdc86a4c3d9a5de83ac6675182
Publikováno v:
Frontiers in Microbiology, Vol 12 (2021)
Phytophthora capsici is an oomycete pathogen responsible for damping off, root rot, fruit rot, and foliar blight in popular vegetable and legume crops. The existence of distinct aggressiveness levels and physiological races among the P. capsici popul
Externí odkaz:
https://doaj.org/article/c9891cda66544999900013483bcdef51
Autor:
Yoo-Joung Yoon, Jelli Venkatesh, Joung-Ho Lee, Jinhee Kim, Hye-Eun Lee, Do-Sun Kim, Byoung-Cheorl Kang
Publikováno v:
Frontiers in Plant Science, Vol 11 (2020)
Many of the recessive virus-resistance genes in plants encode eukaryotic translation initiation factors (eIFs), including eIF4E, eIF4G, and related proteins. Notably, eIF4E and its isoform eIF(iso)4E are pivotal for viral infection and act as recessi
Externí odkaz:
https://doaj.org/article/65f458e480b74f928a38ad4735c2317c
Autor:
Hea-Young Lee, Na-Young Ro, Abhinandan Patil, Joung-Ho Lee, Jin-Kyung Kwon, Byoung-Cheorl Kang
Publikováno v:
Frontiers in Plant Science, Vol 11 (2020)
All modern pepper accessions are products of the domestication of wild Capsicum species. However, due to the limited availability of genome-wide association study (GWAS) data and selection signatures for various traits, domestication-related genes ha
Externí odkaz:
https://doaj.org/article/9a34ed2e57374db8b6450e82100244fb
Autor:
Bong Nam Chung, Joung-Ho Lee, Byoung-Cheorl Kang, Sang Wook Koh, Jae Ho Joa, Kyung San Choi, Jeong Joon Ahn
Publikováno v:
The Plant Pathology Journal, Vol 34, Iss 1, Pp 71-77 (2018)
Resistance to Tomato spotted wilt virus isolated from paprika (TSWV-Pap) was overcome at high temperatures (30 ± 2°C) in both accessions of Capsicum annuum S3669 (Hana Seed Company) and C. chinense PI15225 (AVRDC Vegetable Genetic Resources). S3669
Externí odkaz:
https://doaj.org/article/5cb62fe2621f4def8b2fd48afe5d0bbe
Autor:
Jelli Venkatesh, Seo-Young Lee, Hwa-Jeong Kang, Seyoung Lee, Joung-Ho Lee, Byoung-Cheorl Kang
Publikováno v:
Plant Breeding and Biotechnology. 10:186-196
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e2ce30deab4b90739853339beca14cd
https://doi.org/10.9787/pbb.2022.10.3.186
https://doi.org/10.9787/pbb.2022.10.3.186
Autor:
Lee, Jae-Hoon Yoo, Won-Ji Park, So-Won Kim, Ga-Ram Lee, Jong-Hwan Kim, Joung-Ho Lee, Sae-Hoon Uhm, Hee-Chul
Publikováno v:
Nanomaterials; Volume 13; Issue 11; Pages: 1785
Optimization of equipment structure and process conditions is essential to obtain thin films with the required properties, such as film thickness, trapped charge density, leakage current, and memory characteristics, that ensure reliability of the cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=multidiscipl::4465a8dbdf759f7a2fa163f505a00ef0