Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jouke Krist"'
Autor:
Tom Hoogenboom, Hans Van Der Laan, Erik Byers, Frans Blok, Craig Hickman, Oscar Noordman, Rene Carpaij, Troy Gugel, Sander Stegeman, Jouke Krist, Youri van Dommelen, Christian van Os, Jan van Schoot
Publikováno v:
SPIE Proceedings.
Meeting a specific CD uniformity roadmap becomes more and more difficult as different budget components affecting CD uniformity fail to meet their requirements. For example, reticle manufacturing is at the edge of its potential, and hotplates impact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2731b2d8447075b16c5e3361f4803a1b
https://doi.org/10.1117/12.602129
https://doi.org/10.1117/12.602129
Autor:
Jan Hauschild, Harry J. Levinson, Eric M. Apelgren, Jouke Krist, Anita Fumar-Pici, Bruno La Fontaine, Marco Pieters, Alden Acheta, Mircea Dusa, Marc Boonman, Ashok M. Khathuria
Publikováno v:
SPIE Proceedings.
A Phase-Grating Focus Monitor (PGFM) is used to assess the focus control of a state-of-the-art lithography scanner (TWINSCAN AT:1100) over substrate topography. The starting wafer flatness quality is found to be critical in minimizing the overall def
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f87e64a7dd9b4534ad582c8bb7e490aa
https://doi.org/10.1117/12.485535
https://doi.org/10.1117/12.485535
Autor:
Jack J. Thomas, Jouke Krist, Alden Acheta, Craig B. Sager, Judith van Praagh, Bruno La Fontaine, Mircea Dusa, Harry J. Levinson, Carlo Cornelis Maria Luijten, Jongwook Kye
Publikováno v:
SPIE Proceedings.
We present here a procedure to characterize focus behavior on a first generation prototype 193-nm scanner using phase-shift focus monitors, which clearly identifies the influence of full field dynamic effects and that of the wafer topography and flat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec54807987ba3dd4cab2c1a1746b184a
https://doi.org/10.1117/12.474581
https://doi.org/10.1117/12.474581