Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jou Kikura"'
Autor:
Hiroyuki Fukumizu, Hisataka Hayashi, Daiki Iino, Rei Tanaka, Itsuko Sakai, Hiroaki Kakiuchi, Kiyoshi Yasutake, Satoshi Tanida, Kazuaki Kurihara, Tomoyuki Tanaka, Hiromasa Ohmi, Jou Kikura, Junko Abe, Jota Fukuhara
Publikováno v:
Japanese Journal of Applied Physics. 60:050904
C2F4 is a potential etching gas for high aspect ratio etching of SiO2 films owing to its high etch rate. However, it is difficult to fill C2F4 to a gas cylinder with high pressure for mass production due to its high reactivity. To overcome this probl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01d059d8791a2497bd891b50dc2a5cbc
https://doi.org/10.35848/1347-4065/abf9e3
https://doi.org/10.35848/1347-4065/abf9e3
Autor:
Hiroyuki Fukumizu, Daiki Iino, Hisataka Hayashi, Itsuko Sakai, Jota Fukuhara, Hiroaki Kakiuchi, Hiromasa Ohmi, Jou Kikura, Tomoyuki Tanaka, Rei Tanaka, Kiyoshi Yasutake, Kazuaki Kurihara, Junko Abe
Publikováno v:
Chemical Engineering Science. 229:116125
On-site C2F4 gas production from CF4 feedstock gas was achieved using pure CF4 plasma at a moderate pressure (40–200 Torr) and a relatively low gas temperature. The decomposition of CF4 and the generation of perfluorocarbon gases with a larger numb
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::440155fde72e570951452512da8660ac
https://doi.org/10.1016/j.ces.2020.116125
https://doi.org/10.1016/j.ces.2020.116125