Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Joshua A. Kaitz"'
Autor:
Francis McCallum, Jiacheng Zhao, Md. Daloar Hossain, Joshua A. Kaitz, James F. Cameron, Peter Trefonas, Idriss Blakey, Hui Peng, Andrew K. Whittaker
Publikováno v:
Macromolecules. 56:2651-2662
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd88ff33a0a9daa00ca4cb7f0ba799cb
https://doi.org/10.1021/acs.macromol.2c02382
https://doi.org/10.1021/acs.macromol.2c02382
Autor:
Francis J. McCallum, Jiacheng Zhao, Daloar Hossain, Joshua A. Kaitz, James F. Cameron, Peter Trefona, Idriss Blakey, Hui Peng, Andrew K. Whittaker
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13500fa2c3a818c5e772ed0dae74eab2
https://doi.org/10.1117/12.2655986
https://doi.org/10.1117/12.2655986
Autor:
Andrew K. Whittaker, Peter Trefonas, Francis J. McCallum, Idriss Blakey, Changkui Fu, Jiacheng Zhao, James F. Cameron, Sisi Wang, Joshua A. Kaitz, Gerald Er, Hui Peng
Publikováno v:
Macromolecules. 54:4860-4870
Photoresponsive polymers capable of luminescence switching are attracting significant interest due to their potential application in fluorescence patterning, bioimaging, optical data storage, and anti-counterfeiting. In this work, we have developed a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::309467061591253dd3066086a17e5ce8
https://doi.org/10.1021/acs.macromol.1c00297
https://doi.org/10.1021/acs.macromol.1c00297
Autor:
Francis J. McCallum, James F. Cameron, Jiacheng Zhao, Joshua A. Kaitz, Peter Trefonas, Changkui Fu, Idriss Blakey, Hui Peng, Ye Yu, Andrew K. Whittaker
Publikováno v:
Polymer Chemistry. 12:3201-3209
Photo-directed orientation control of block copolymer (BCP) domains is a powerful method for generating distinct regions of perpendicular and parallel-aligned lamella in a single film layer. In this study we demonstrate the versatility of aromatic me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66b193ada58baad6c37c0d75480894f7
https://doi.org/10.1039/d1py00501d
https://doi.org/10.1039/d1py00501d
Autor:
Mingqi Li, Chris A. Mack, James W. Thackeray, Tomas Marangoni, Rochelle Rena, John Nelson, Jason DeSisto, Emad Aqad, Choong-Bong Lee, Xisen Hou, Charlotte Cutler, Joshua A. Kaitz
Publikováno v:
Journal of Photopolymer Science and Technology. 31:679-687
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::babe8b098535ffaad827f4e0734ba6e1
https://doi.org/10.2494/photopolymer.31.679
https://doi.org/10.2494/photopolymer.31.679
Autor:
Andrew K. Whittaker, James F. Cameron, Hui Peng, Joshua A. Kaitz, Idriss Blakey, Francis J. McCallum, Peter Trefonas, Zhen Jiang, Jiacheng Zhao
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Photo-directed orientation control of block copolymer (BCP) domains is a powerful method for generating distinct regions of perpendicular and parallel-aligned lamella in a single film layer. In this study we demonstrate the versatility of Poly(aryl m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3187e1c922e18f32c2da928542fd083f
https://doi.org/10.1117/12.2586516
https://doi.org/10.1117/12.2586516
Autor:
Ke Yang, Amy Kwok, Joshua A. Kaitz, Choong Bong Lee, Ryan Lee, Thomas Cardolaccia, Xisen Hou, Amiel Evans, Mingqi Li
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
To maximize value in integrated circuit manufacturing, semiconductor manufacturers continually seek materials that enable processing with higher throughput and which provide higher yield. 193nm immersion lithography (193i) has been a mainstay in semi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d308a559bafba23deb2dbf646e061712
https://doi.org/10.1117/12.2583735
https://doi.org/10.1117/12.2583735
Autor:
Cong Liu, Vipul Jain, Iou-Sheng Ke, Amy Kwok, James Park, Janet Wu, Jin Wuk Sung, Mingqi Li, Jong Keun Park, Joshua A. Kaitz
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Miniaturization of lithographic feature sizes via shrink technologies is under development in order to extend 193nm immersion lithographic capabilities and achieve sub-20nm critical dimensions (CD) in integrated circuit manufacturing before extreme u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8050f6c3d7a0e3f4c23af9e6bdbc748f
https://doi.org/10.1117/12.2518366
https://doi.org/10.1117/12.2518366
Autor:
James F. Cameron, Iou-Sheng Ke, Li Cui, Paul J. LaBeaume, Shintaro Yamada, Lei Zhang, Lawrence Chen, Bhooshan C. Popere, Johnpeter N. Ngunjiri, Kenneth L. Kearns, Greene Daniel, Benjamin Foltz, Keren Zhang, Suzanne Coley, Sabrina Wong, Joshua A. Kaitz
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
The use of multilayer processes in advanced ArF patterning schemes continues to increase as device critical dimensions shrink. In a multilayer stack, underlayer materials play a critical role in terms of gap fill, planarization and etch resistance to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::168656f1d653d7afa1fdef2d0c180e6e
https://doi.org/10.1117/12.2514968
https://doi.org/10.1117/12.2514968
Autor:
Jeffrey S. Moore, Catherine M. Possanza Casey, Chan Woo Park, Olivia P. Lee, Christopher L. Plantz, Hector Lopez Hernandez, Scott R. White, Joshua A. Kaitz
Publikováno v:
Macromolecular rapid communications. 39(11)
Thermally triggerable polymer films that degrade at modest temperatures (≈85 °C) are created from a blend of cyclic polyphthalaldehyde (cPPA) and a polymeric thermoacid generator, poly(vinyl tert-butyl carbonate sulfone) (PVtBCS). PVtBCS depolymer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5740cd0fee9e9470d5552d5fa04a697a
https://pubmed.ncbi.nlm.nih.gov/29709094
https://pubmed.ncbi.nlm.nih.gov/29709094