Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Josh Thornes"'
Autor:
Siqi Luo, Will Conley, James Bonefede, Natallia Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar Rao, marc sells, Josh thornes
Publikováno v:
Photomask Technology 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f33c840c7d9993328022638344cfccf
https://doi.org/10.1117/12.2648306
https://doi.org/10.1117/12.2648306
Autor:
Paolo Alagna, Kuo-Tai Teng, Omar Zurita, Will Conley, Sam Liu, Josh Thornes, Stephen Hsu, Xiang-ru Xu
Publikováno v:
Optical Microlithography XXXIII.
Over the years, lithography engineers have continued to focus on CD control, overlay and process capability to meet node requirements for yield and device performance. The use of ArFi lithography for advanced process nodes demands challenging pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ae499321d0b1ed5c9b195e0bcd14e6c
https://doi.org/10.1117/12.2552505
https://doi.org/10.1117/12.2552505
Publikováno v:
Optical Microlithography XXXI.
DUV ArF immersion lithography requires patterning budget improvements in the range of 1/10 nm especially for interconnect layers for advanced process nodes. As every angstrom counts, the Cymer XLR 860ix light source has been developed to deliver the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83a51d6be0b503576a66d6e1fd8bcbc5
https://doi.org/10.1117/12.2298431
https://doi.org/10.1117/12.2298431
Publikováno v:
SPIE Proceedings.
In response to significant neon supply constraints, Cymer has responded with a multi-part plan to support its customers. Cymer’s primary objective is to ensure that reliable system performance is maintained while minimizing gas consumption. Gas alg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95a395c6c9f4a9a1127982765eee5402
https://doi.org/10.1117/12.2219942
https://doi.org/10.1117/12.2219942
New ArF immersion light source introduces technologies for high-volume 14nm manufacturing and beyond
Autor:
Will Conley, John T. Melchior, Theodore Cacouris, E. Gross, Tanuj Aggarwal, Josh Thornes, T. Bibby
Publikováno v:
SPIE Proceedings.
Semiconductor market demand for improved performance at lower cost continues to drive enhancements in excimer light source technologies. Multi-patterning lithography solutions to extend deep-UV (DUV) immersion have driven requirements such as higher
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2caaf74fdae10391abbaeeadc0f5fb6
https://doi.org/10.1117/12.2085968
https://doi.org/10.1117/12.2085968
Autor:
Brian Wehrung, John Wyman, Ronnie P. Flores, Matt Lake, Will Conley, Josh Thornes, Alicia Russin, Hoang Dao, Aleks Simic, David Dunlap, Kevin Michael O'brien
Publikováno v:
SPIE Proceedings.
As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0075924ac6f0e0a1f0b691cab6fc059
https://doi.org/10.1117/12.2048305
https://doi.org/10.1117/12.2048305
Autor:
Jen-Shiang Wang, Josh Thornes, R. Burdt, Mason Eric Anders, Gregory Rechtsteiner, R. Rokitski, T. Bibby, M. Haviland, Daniel Brown, J. Melchior, D. Haran, T. Duffey, Tanuj Aggarwal
Publikováno v:
SPIE Proceedings.
Semiconductor market demand for improved performance at lower cost continues to drive enhancements in excimer light source technologies. Increased output power, reduced variability in key light source parameters, and improved beam stability are requi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::584c23d0c1e76de842ebc1b0cfdbcc32
https://doi.org/10.1117/12.2048082
https://doi.org/10.1117/12.2048082
Autor:
Matthew E. Anderson, Josh Thornes, Phillip Poon, Bojan Resan, Luis Archundia, Peter J. Delfyett, Frank Wise
Publikováno v:
Optics and Photonics News. 15:43
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::65fb0ccb88ab41e83007fd8a1718833c
https://doi.org/10.1364/opn.15.12.000043
https://doi.org/10.1364/opn.15.12.000043
Publikováno v:
Journal of the Optical Society of America B. 21:1387
We demonstrate a technique for correcting arbitrary spectral-phase aberrations in a single iteration with no reference pulse. By utilizing spectral-phase interferometry for direct electric field reconstruction and a programmable liquid-crystal spatia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe8c340a739ca047386e0ca93cea6b04
https://doi.org/10.1364/josab.21.001387
https://doi.org/10.1364/josab.21.001387
Autor:
CONCEPCION, MARIEL
Publikováno v:
San Diego Business Journal. 10/18/2021, Vol. 42 Issue 42, p10-33. 2p.