Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Joseph Pankert"'
Publikováno v:
Laser Technik Journal. 9:48-51
Systems with arrays of VCSELs can realize multi kilowatt output power. The inherent simplicity of VCSELs enables a performance and cost breakthrough in solutions for thermal processing and the pumping of solid state lasers. Wafer-level integrated mic
Autor:
Jeroen Jonkers, Rolf Wester, Günther Derra, Klaus Bergmann, Joseph Pankert, Thomas Krücken, Willi Neff, Dominik Marcel Vaudrevange, Stefan Seiwert, Oliver Rosier, Rolf Apetz, Peter Zink, Guido Siemons, Jürgen Klein, Sven Probst, Christopher Smith, Michael Loeken
The light source has been identified as being the most critical single component on the way to realizing EUVL. The requirements on the source are derived from a throughput model for the processing of up to 120 wafers per hour in a commercial EUV scan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a4a7fa5817fed0ace52288703cda14d
https://doi.org/10.1117/3.613774.ch13
https://doi.org/10.1117/3.613774.ch13
Publikováno v:
Physica C: Superconductivity. 182:291-296
By means of the recently established ultrasonic technique, activation energies for the vortex lattice of various high- T c superconductors are determined. These are deduced from the characteristic maximum in the field induced attenuation which is ass
Publikováno v:
Physica C: Superconductivity. 174:289-302
The ultrasonic attenuation and velocity shift, induced by the vortex lattice of high- T c superconductors, are measured as a function of field, frequency and temperature. Two different ceramic samples, both of the Bi-2223 composition, are investigate
Autor:
Marcel F. Schemmann, Armand Pruijmboom, Joseph Pankert, Holger Moench, Jeroen Schutte, Jochen Hellmig
Publikováno v:
SPIE Proceedings.
There are many applications for non-contact measurement of the displacement and velocity of moving objects, especially when achieved at low cost. An optical displacement sensor has been developed that can be compared to expensive laserinterferometry
Publikováno v:
Physical Review Letters. 65:3052-3055
Measurements of the transverse sound attenuation and velocity in a ceramic ${\mathrm{Bi}}_{1.6}$${\mathrm{Pb}}_{0.4}$${\mathrm{Sr}}_{2}$${\mathrm{Ca}}_{2}$${\mathrm{Cu}}_{3}$${\mathrm{O}}_{\mathit{y}}$ superconductor (${\mathit{T}}_{\mathit{c}}$=110
Autor:
Joseph Pankert
Publikováno v:
Physica C: Superconductivity. 168:335-345
In the mixed state of type II superconductors, flux lines interact with the crystal lattice via pinning. We demonstrate how this interaction results in a modified behaviour of the sound attenuation and dispersion, if the vortex dynamics is assumed to
Autor:
Klaus Bergmann, Joseph Pankert, Willi Neff, Bernhard Jagle, Juergen Kleinschmidt, Uwe Stamm, Andre Egbert, Christian Ziener, Vivek Bakshi, Guido Schriever, Rainer Lebert, Christian Wies, Marc Corthout, Deborah Gustafson
Publikováno v:
23rd European Mask and Lithography Conference.
Extreme ultraviolet lithography (EUVL) is the leading technology for patterning at the 32 nm technology node and be-yond. EUVL light at 13.5 nm is used to print circuits. This light is produced by heating fuel (Xe, Sn) in EUV sources to a very high t
Autor:
Willi Neff, Oliver Franken, Andreas List, Marcel Damen, Oliver Zitzen, Maurice Janssen, Klaus Bergmann, Joseph Pankert, Helmar Kraus, Peter Zink, Dominik Marcel Vaudrevange, Dirk Wagemann, Thomas Krücken, Stefan Schwabe, Micheal Loeken, Stefan Seiwert, Rolf Apetz, Oliver Rosier, Günther Derra, Christof Metzmacher, Ralph Prummer, Achim Weber, Jeroen Jonkers, Arnaud Mader, Sven Probst, Guido Siemons, Jürgen Klein
Publikováno v:
SPIE Proceedings.
In this paper, we report on the recent progress of the Philips Extreme UV source. The Philips source concept is based on a discharge plasma ignited in a Sn vapor plume that is ablated by a laser pulse. Using rotating electrodes covered with a regener
Autor:
Rainer Lebert, Andre Egbert, Willi Neff, Juergen Kleinschmidt, Bernhard Jagle, Uwe Stamm, Christian Wies, Klaus Bergmann, Joseph Pankert, Guido Schriever, Kai Gaebel
Publikováno v:
SPIE Proceedings.
In EUV lithography, extreme ultraviolet radiation of 13.5 nm wavelength is used to print feature with resolutions consis-tent with the requirements of the 45 nm technology node or below. EUV is produced by heating xenon, tin, or other ele-ments to a