Zobrazeno 1 - 10
of 76
pro vyhledávání: '"Joseph J. Kopanski"'
Publikováno v:
International Symposium for Testing and Failure Analysis.
In recent years, scanning probe microscopy (SPM) has drawn substantial attention for subsurface imaging, since the ultrasharp AFM tip (≈ 10 nm in radius) can deliver and detect, mechanical and electrical signals right above the material’s 3D volu
Publikováno v:
2021 International Conference on IC Design and Technology (ICICDT).
Autor:
Kin P. Cheung, Jason T. Ryan, David Nminibapiel, Jason P. Campbell, Pragya R. Shrestha, Ji-Hong Kim, Joseph J. Kopanski
Publikováno v:
IEEE Transactions on Electron Devices. 63:3851-3856
We report a new technique for the rapid measurement of full capacitance-voltage ( $C$ – $V$ ) characteristic curves. The displacement current from a 100-MHz applied sine wave, which swings from accumulation to strong inversion, is digitized directl
Publikováno v:
ECS Transactions. 72:131-138
Buried interfaces in electronics determine device properties. Characterization and control of these interfaces is the key to reliably manufacturing devices with high performance. We see an opportunity for electrical scanning probe microscope (eSPM) b
Publikováno v:
ECS Transactions. 69:79-88
This work develops a combined surface-activated bonding (SAB) technique for low-temperature SiO2-SiO2 and Cu-Cu bonding at 200 °C. The combined SAB technique involves combinations of surface activation by using surface bombardment by neutralized Ar
Autor:
Ji-Hong, Kim, Pragya R, Shrestha, Jason P, Campbell, Jason T, Ryan, David, Nminibapiel, Joseph J, Kopanski, Kin P, Cheung
Publikováno v:
IEEE transactions on electron devices. 63(10)
We report a new technique for the rapid measurement of full capacitance-voltage (C-V) characteristic curves. The displacement current from a 100 MHz applied sine-wave, which swings from accumulation to strong inversion, is digitized directly using an
Publikováno v:
ECS Journal of Solid State Science and Technology. 4:N3113-N3117
In this paper, we discuss the use of broadband high frequency electromagnetic waves (RF) to non-destructively identify, classify and characterize performance-limiting defects in emerging nanoelectronic devices. As an illustration, the impact of therm
Publikováno v:
ECS Transactions. 61:113-121
Three dimensional stacked integrated circuits (3D-ICs), achieved using through-silicon vias (TSV), is an enabler for the continued miniaturization, increased performance and functional diversification of microelectronic devices. However, their introd
Publikováno v:
Journal of Applied Physics. 125:075706
Precise control of dopant placement is crucial for the reproducible, and reliable, nanoscale semiconductor device fabrication. In this paper, we demonstrate an atomic force microscopy (AFM) probe assisted localized doping of aluminum into an n-type s
Autor:
Joseph J. Kopanski, Joseph L. Tedesco, Madelaine Hernández-Mora, A.A. Herzing, Laurie Stephey, Christina A. Hacker, Nadine Gergel-Hackett, Curt A. Richter
Publikováno v:
ECS Transactions. 35:111-120
Memristors were fabricated on flexible polyethylene terephthalate substrates consisting of an oxide film generated through hydrolysis of a spun-on sol-gel. X-ray photoelectron spectroscopy, spectroscopic ellipsometry, transmission electron microscopy