Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Joseph Edward Griffith"'
Autor:
Joseph Edward Griffith, Greg Kochanski
Publikováno v:
Surface Science. 249:L293-L299
There is controversy over the details of the reconstruction on Si(100), specifically whether the dimers are symmetric or asymmetric. We propose a Ginzberg-Landau model of the surface where the dimers are free to tilt. The model is consistent with rec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44dc6e42cc9fda016f3513f8925880ae
https://doi.org/10.1016/0039-6028(91)90816-b
https://doi.org/10.1016/0039-6028(91)90816-b
Autor:
Raymond A. Cirelli, Donald M. Tennant, O. R. Wood, James R. Sweeney, Joseph Edward Griffith, Myrtle I. Blakey, D. L. White
Publikováno v:
SPIE Proceedings.
In dark-field (DF) lithography, light from the condenser illuminates the reticle at such a steep angle that non- diffracted light is lost from the system. A DF reticle contains a series of sub-resolution amplitude gratings to diffract light from the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ffedf4fe9579218349db9bbe22eb74c
https://doi.org/10.1117/12.435686
https://doi.org/10.1117/12.435686
Autor:
Herschel M. Marchman, Joseph Edward Griffith, George W. Banke, Bhanwar Singh, Lee Edward Trimble, E. Hal Bogardus, Arnold W. Yanof, Lumdas H. Saraf, Michael T. Postek, John A. Allgair, Neal T. Sullivan, Jerry E. Schlesinger, Charles N. Archie, András E. Vladár
Publikováno v:
SPIE Proceedings.
The stringent critical dimension control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b4c28b986cf18af8b7f992717a3bd53
https://doi.org/10.1117/12.308724
https://doi.org/10.1117/12.308724
Autor:
J. J. Plombon, Gabriel Lorimer Miller, Joseph Edward Griffith, L. C. Hopkins, E. Snyder, Jeffery B. Bindell, Leonid Vasilyev, Charles E. Bryson
Publikováno v:
SPIE Proceedings.
One of the fundamental requirements for reliable critical dimension measurement with a scanning probe microscope is stability of the stylus against flexing and against erosion. We report on the wear of an etched optical fiber when scanned across a va
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15345212278ac38fe131e5aee41e1974
https://doi.org/10.1117/12.275932
https://doi.org/10.1117/12.275932
Autor:
J E. Liddle, Joseph Edward Griffith, L. Fetter, Samuel N. Jones, L. C. Hopkins, Myrtle I. Blakey, Milton L. Peabody, Anthony E. Novembre, Reginald C. Farrow, Jeremiah R. Lowney, William J. Keery, Michael T. Postek, H. A. Huggins
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2167
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eb17189eb35b04b3ffb7e5cbb75bb40a
https://doi.org/10.1116/1.589346
https://doi.org/10.1116/1.589346
Autor:
M. Hecht, E. J. Snyder, A. Berghaus, L. C. Hopkins, Jeffery B. Bindell, Leonid Vasilyev, Charles E. Bryson, J. J. Plombon, Joseph Edward Griffith
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 15:2189
To measure the angle of a wall, the probe of a stylus profiler must be able to reach the wall. Sample tilting substantially expands the range of wall angles accessible to a profiler. Tilting also allows flared probe tip characterizers to be used more
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2db09f251909ce9a2c1185fc360ed721
https://doi.org/10.1116/1.589611
https://doi.org/10.1116/1.589611