Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Joseph C. Vigil"'
Publikováno v:
SPIE Proceedings.
Chemically amplified DUV photoresists have a sensitivity to certain airborne chemical contaminants. Processing these resists requires control of the environment within the process tooling. This study explores the contamination threshold levels to mee
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbf3e78077882220adba75a0d1a4d1f3
https://doi.org/10.1117/12.210386
https://doi.org/10.1117/12.210386
Publikováno v:
SPIE Proceedings.
The MICRASCAN-II (MS-II) is a 0.50 NA DUV broadband illumination (245 nm to 252 nm) step-and-scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The system is designed to provide 350 nm r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a209e3e327ce8949d0cbc3e8cb42b05
https://doi.org/10.1117/12.175489
https://doi.org/10.1117/12.175489
Autor:
Bob Patterson, Mark William Barrick, Karey L. Holland, Timothy J. Wiltshire, Katherine C. Norris, Joseph C. Vigil, Doug Bommarito, Yumiko Takamori
Publikováno v:
SPIE Proceedings.
The Micrascan II is a 0.50 NA DUV, broadband illumination (245 nm to 252 nm) step-and- scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The tool has been designed to provide 350 nm res
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::853a2508ea61ccc95b777684688f85c9
https://doi.org/10.1117/12.150455
https://doi.org/10.1117/12.150455
Publikováno v:
SPIE Proceedings.
An experimental study was conducted to correlate wafer site flatness SFQD with stepper performance for half-micron lines and spaces. CD measurements were taken on wafers patterned on both GCA pre-production XLS i-line and SVGL Micrascan-90 DUV steppe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8dd0f74021d231f57fd3545c172ea5d6
https://doi.org/10.1117/12.59805
https://doi.org/10.1117/12.59805
Publikováno v:
SPIE Proceedings.
Deep UV exposures utilizing wavelengths from 240-254 nm have been investigated for 0.5 micron lithography on a 0.35 NA step-and-scan exposure tool, the SVG Lithography Systems Inc. Microscan-90. Commercially available Shipley SNR-248 3X negative resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1243724c88b9243dfa7bcd659426fcbb
https://doi.org/10.1117/12.44821
https://doi.org/10.1117/12.44821
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