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pro vyhledávání: '"Jos P. Weterings"'
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:3419
A bilayer resist system, consisting of hydrogen silsesquioxane (HSQ) as negative tone electron (e)-beam resist top coat and hard baked novolak resist as bottom coat, has been investigated for its ability to yield high aspect ratio nanoscale structure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::558f6bbeb8cfb0285c2b1120f33ab5d1
https://doi.org/10.1116/1.1319682
https://doi.org/10.1116/1.1319682
