Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Joost Sytsma"'
Autor:
Francesco Perez-Murano, Livio Baldi, Hiroyuki Miyashita, Stéphanie Gaugiran, Luisa Rita Atzei, Patrick Wong, Xavier Buch, Dick Verkleij, Paolo Piacentini, Pietro Cantu, David Mecerreyes, Joost Sytsma, Bertrand Le Gratiet, Olivier Toublan
Publikováno v:
SPIE Proceedings.
In 2009 a new European initiative on Double Patterning and Double Exposure lithography process development was started in the framework of the ENIAC Joint Undertaking. The project, named LENS (Lithography Enhancement Towards Nano Scale), involves twe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ae1a9718332af76671146b4ae2777ea
https://doi.org/10.1117/12.846030
https://doi.org/10.1117/12.846030
Publikováno v:
Journal of Physics and Chemistry of Solids. 53:1147-1152
The Gd3+ emission of NaGdCl4 and Na3GdCl6 is reported. In the former compound energy migration to traps occurs, in the latter energy migration is absent and intrinsic Gd3+ emission is observed. Several aspects of the emission and energy migration are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d545227f6f0c6e2abef020a16c8bd65e
https://doi.org/10.1016/0022-3697(92)90031-8
https://doi.org/10.1016/0022-3697(92)90031-8
Publikováno v:
AIP Conference Proceedings.
The International Technology Roadmap for Semiconductors shows the lithography technology nodes in terms of critical dimension to be reached. This critical dimension is proportional to the ratio of the exposure wavelength (λ) and the numerical apertu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::900a53cede50209a78d09f929f01d267
https://doi.org/10.1063/1.1354422
https://doi.org/10.1063/1.1354422
Publikováno v:
SPIE Proceedings.
Fluorescent molecules having single-photon absorption in the blue and the UV can be excited with infra-red light via a process known as two-photon excitation. The combination of this technique with scanning techniques can be exploited for 3D microsco
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::140c8b848afa92ce61d3af6eeb0948c7
https://doi.org/10.1117/12.205328
https://doi.org/10.1117/12.205328
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