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Autor:
Robert P. Ebeling, Rory de Zanger, F.T. Molkenboer, Michael Dekker, Chien-Ching Wu, Michel van Putten, Jochem Janssen, Herman H. P. Th. Bekman, Arnold Storm, Corné Rijnsent, Joop Meijlink, Norbert B. Koster, Jetske Stortelder, Kyri Nicolai
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2019.
Adoption of EUV lithography for high-volume production is accelerating. TNO has been involved in lifetime studies from the beginning of the EUV alpha demo tools. One of the facilities for these studies is the EUV Beam Line (EBL1) designed and install
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a579e112a4955ccb9c63ece7ac1b0cbf
https://doi.org/10.1117/12.2536531
https://doi.org/10.1117/12.2536531
