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Publikováno v:
International Journal of Precision Engineering and Manufacturing-Green Technology. 7:929-938
As the feature size of semiconductor chips is decreasing down to nanometric scales, cleaning of nanoscale contaminant particles without damaging the fine features puts forth severe technological challenges. Here we introduce a design methodology of a
Autor:
Lee, Jae Hong, Kim, Joonoh, Kim, Seungho, Lee, Joongha, Kim, Jinkyu, Choi, Kihoon, Kim, Ho-Young
Publikováno v:
International Journal of Precision Engineering & Manufacturing-Green Technology; 2020, Vol. 7 Issue 5, p929-938, 10p