Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Joongeok Kim"'
Autor:
Jae Wan Lee, Wonjoon Choi, Won-Suk Ohm, Eikhyun Cho, Sung Min Cho, Taekyung Kim, Gwanwoo Park, Shinill Kang, Joongeok Kim
Publikováno v:
Ultrasonics. 66:133-139
We report a method of fabricating backing blocks for ultrasonic imaging transducers, using alumina/epoxy composites. Backing blocks contain scatterers such as alumina particles interspersed in the epoxy matrix for the effective scattering and attenua
Publikováno v:
Journal of Manufacturing Science and Engineering. 141
Recently, carbon emissions and global warming have become major issues, and efforts are being made to develop sustainable manufacturing systems and improve product lifespans. Waste and greenhouse gases created during manufacturing can be minimized us
Publikováno v:
Journal of Nanoscience and Nanotechnology. 11:5921-5927
The technology of depositing a uniform and stable anti-adhesion layer on a wafer-scale nanostamp is a critical issue in the industrialized nanoimprinting process. The deposition of an anti-adhesion layer involves O2 plasma treatment to modify the sta
Publikováno v:
Journal of Manufacturing Science & Engineering; Feb2019, Vol. 141 Issue 2, p1-9, 9p
Publikováno v:
Optics express. 18(8)
We propose an optical design process that significantly reduces the time and costs in direct backlight unit (BLU) development. In it, the basic system specifications are derived from the optical characteristics of RGB light-emitting diodes (LEDs) com
Publikováno v:
OPTICS EXPRESS(23): 15
The increasing demand for lightweight, miniaturized electronic devices has prompted the development of small, high-performance optical components for light-emitting diode (LED) illumination. As such, the Fresnel lens is widely used in applications du
Autor:
Joongeok Kim, Soonkyu Je, Shinill Kang, Jinhyung Lee, Heejin Nho, Jongmyeong Shim, Min-Soo Kim, Seok-min Kim, Jungjin Han
Publikováno v:
Japanese Journal of Applied Physics. 52:10MC04
Laser interference lithography (LIL) is a technique that allows maskless patterning of large areal periodic nano/micro structures. The LIL pattern is often used as an etch barrier to pattern SiO2 intermediate layer in the fabrication process of high
Publikováno v:
Journal of Micromechanics & Microengineering; Dec2014, Vol. 24 Issue 12, p1-1, 1p