Reduction of plasma-induced damage during intermetal dielectric deposition in high-density plasma.

Autor: Kyung-Mun Byun, Do-Hyung Kim, Yong-Won Cha, Sang-Hyeon Lee, Min Kim, Joo-Beom Lee, In-Sun Park, Hyeon-Deok Lee, Chang-Lyong Song

Publikováno v: 2005 International Conference on Integrated Circuit Design & Technology, 2005. ICICDT 2005; 2005, p99-102, 4p