Zobrazeno 1 - 10
of 26
pro vyhledávání: '"Jongheon Kwak"'
Autor:
Chungryong Choi, Jichoel Park, Kanniyambatti L. Vincent Joseph, Jaeyong Lee, Seonghyeon Ahn, Jongheon Kwak, Kyu Seong Lee, Jin Kon Kim
Publikováno v:
Nature Communications, Vol 8, Iss 1, Pp 1-8 (2017)
Block copolymers that form nanodomains and are used in nanolithography usually do not form nanopatterns with multiple shapes. Here the authors report a block copolymer that allows for UV- induced cleavage of one arm and demonstrate the transformation
Externí odkaz:
https://doaj.org/article/28d8523d6a88453cb29e5dc13c663c6c
Publikováno v:
Macromolecules. 50:9373-9379
We studied the phase behavior of the poly(2-vinylpyridine)-block-poly(4-vinylpyridine) copolymer (P24VP) containing gold nanoparticles, by rheometry, small-angle X-ray scattering, transmission electron microscopy (TEM), and differential scanning calo
Publikováno v:
Macromolecules. 50:9008-9014
We investigated, via small-angle X-ray scattering and transmission electron microscopy, the morphologies of binary blend of polyisoprene-b-polystyrene-b-poly(2-vinylpyridine) (ISP) triblock terpolymer and polyisoprene-b-polystyrene (IS) diblock copol
Autor:
Jaeyong Lee, Jin Kon Kim, Jichoel Park, Kanniyambatti L. Vincent Joseph, Kyu Seong Lee, Chungryong Choi, Jongheon Kwak, Seonghyeon Ahn
Publikováno v:
Nature Communications, Vol 8, Iss 1, Pp 1-8 (2017)
NATURE COMMUNICATIONS(8)
Nature Communications
NATURE COMMUNICATIONS(8)
Nature Communications
Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopa
Autor:
Mooseong Kim, Jaeyong Lee, Sandip Maiti, Chungryong Choi, Jongheon Kwak, Kyu Seong Lee, Jin Kon Kim, Avnish Kumar Mishra
Publikováno v:
Macromolecules. 50:6813-6818
For ultrahigh-density storage media and D-RAM, the feature size of lithography should be much reduced (say less than 10 nm). Though some research groups reported feature size of 5–6 nm, further reduced feature size is needed for next-generation lit
Publikováno v:
ACS Applied Materials & Interfaces. 9:31245-31251
To apply well-defined block copolymer nanopatterns to next-generation lithography or high-density storage devices, small line edge roughness (LER) of nanopatterns should be realized. Although polystyrene-block-poly(methyl methacrylate) copolymer (PS-
Autor:
Jin Kon Kim, K. L. Vincent Joseph, Avnish Kumar Mishra, Sandip Maiti, Chungryong Choi, Jicheol Park, Seung Hyun, Jongheon Kwak
Publikováno v:
Polymer. 100:28-36
Well-defined amphiphilic and biocompatible poly(vinyl alcohol)- block -poly( l -lactide) copolymers (PVA- b -PLLA) were synthesized by the combination of reversible addition-fragmentation chain transfer (RAFT), ring opening polymerization (ROP), and
Publikováno v:
Macromolecules. 49:3647-3653
Autor:
K.-B. Lee, Jongheon Kwak, Jicheol Park, Hong Chul Moon, Won Bo Lee, Sangshin Jang, Gumhye Jeon, Jin Kon Kim
Publikováno v:
Advanced Functional Materials. 25:5414-5419
Vertical orientation of lamellar and cylindrical nanodomains of block copolymers on substrates is one of the most promising means for developing nanopatterns of next-generation microelectronics and storage media. However, parallel orientation of lame
Autor:
Sung Hyun Han, Victor Pryamitsyn, Jaseung Koo, Venkat Ganesan, Jin Kon Kim, Hong Chul Moon, Jeong Soo Lee, Jongheon Kwak
Publikováno v:
Macromolecules. 48:1262-1266