Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Jong Wha Kim"'
Publikováno v:
RSC Advances. 13:8153-8162
The pretreatment of cellulose using the dissolution/regeneration process in ionic liquid and deep eutectic solvents leads to substantially higher hydrolysis efficiency than the conventional ball-milling pretreatment.
The efficient hydrolysis of cellulose into its monomer unit such as glucose or valuable cello-oligosaccharides is the critical step for the cost-effective production of biofuels and biochemicals. However, the current cellulose hydrolysis process invo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::321a2ca965493265b8d0f9044fa50dd0
https://doi.org/10.21203/rs.3.rs-1916934/v1
https://doi.org/10.21203/rs.3.rs-1916934/v1
Autor:
Su Shiung Lam, Jungho Jae, Cheol Park, Young-Kwon Park, Han Ung Kim, Jeong-Myeong Ha, Jong Wha Kim
Publikováno v:
International Journal of Energy Research. 45:16349-16361
Publikováno v:
Journal of the Korean Society of Fisheries Technology. 52:339-346
Publikováno v:
Korean Journal of Chemical Engineering. 18:525-530
The adsorption characteristics of H2O on zeolite 13X were measured by a gravimetric method. The adsorption isotherm showed type II isotherm and was fitted by using both the excess surface work (ESW) model and Langmuir-Freundlich model. The results pr
Publikováno v:
Journal of Educational Technology. 15:301-330
Publikováno v:
Korean Journal of Chemical Engineering. 15:217-222
Titanium oxide thin films were deposited on p-type Si(100), SiO2/Si, and Pt/Si substrates by plasma enhanced chemical vapor deposition using high purity Ti(O-i-C3H7)4 and oxygen. As-deposited amorphous TiO2 thin films were treated by rapid thermal an
Publikováno v:
Journal of Electronic Materials. 26:1394-1400
Dielectric PbTiO3-thin films were prepared on p-Si(100) substrate by plasma enhanced metalorganic chemical vapor deposition using high purity Ti(O-i-C3H7)4, Pb(tmhd)2, and oxygen. As-deposited films were post-treated by rapid thermal annealing method
Publikováno v:
Korean Journal of Chemical Engineering. 13:473-477
Titanium oxide thin films were prepared on p-Si(l00) substrate by plasma enhanced chemical vapor deposition using high purity titanium isopropoxide and oxygen. The deposition rate was little affected by oxygen flow rate, but significantly affected by
Publikováno v:
Korean Circulation Journal. 13:225