Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Jon Dennis"'
Publikováno v:
ICASSP
Smart plugs are useful devices for measuring the appliance load, but intrusive. It has long been the goal of energy companies and researchers to monitor the load of all household appliances in a non-intrusive manner, using only a single smart meter.
Publikováno v:
SPIE Proceedings.
Airborne molecular contamination (AMC) continues to play a very decisive role in the performance of many microelectronic devices and manufacturing processes. Besides airborne acids and bases, airborne organic contaminants such as 1-methyl-2-pyrrolidi
Publikováno v:
SPIE Proceedings.
Molecular bases have long been known to be a problem in photolithographic applications using chemically amplified photoresists. Of these molecular bases, ammonia and 1-methyl-2-pyrrolidinone (NMP) have been studied in the most detail since chemical f
Publikováno v:
SPIE Proceedings.
Airborne molecular contamination (AMC) continues to play a very decisive role in the performance of many microelectronic devices and manufacturing processes. Currently, the state of the filtration industry is such that optimum filter life and removal
Readers' perspectives. The Bush Administration and Congress understand the level of federal funding?
Autor:
Megan, Barney, Hughes, Thomas, Michael, Smith, Jon, Dennis, Springer, Bill, Gary, Janko, Jacob Aaron, Rupp, Dan, Rode, John, Wade
Publikováno v:
Health data management. 13(4)
Publikováno v:
Health data management. 13(2)
Autor:
Jon Dennis Joriman, Andrew J. Dallas, Kevin Seguin, Jeremy Exley, Jonathan G. Parsons, Lefei Ding, Brian Hoang, Dustin Zastera
Publikováno v:
SPIE Proceedings.
Part per billion concentrations of acid gases such as SOx and NOx have been detected in both high purity gases and CDA lines. These contaminants can have deleterious effects on a number of high purity applications such as the optics found in lithogra
Autor:
Kevin Seguin, Brian Hoang, Lefei Ding, Andrew J. Dallas, Jonathan G. Parsons, Jon Dennis Joriman
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
The requirement to extend existing lithography equipment working levels and life has required manufacturers and end users to extend their filtration requirements beyond airborne base gases. Due to the effect acid gases can have on optics, masks, reti
Autor:
Jon Dennis Joriman, Jonathan G. Parsons, Kevin Seguin, Brian Hoang, William Lefei Ding, Andrew J. Dallas
Publikováno v:
SPIE Proceedings.
The optimal medium in which DUV resists are exposed is becoming increasingly under investigation by lithography tool manufacturers. These medium requirements have created even more design restrictions for effective filtration methods. Traditional air
Autor:
Richard Ringold, Debbie Arends, Jon Dennis Joriman, Kristine M. Graham, Kristen Fischer, Andrew J. Dallas
Publikováno v:
SPIE Proceedings.
It has been well documented that DUV lithographic processes are sensitive to airborne contamination such as ammonia and n- methyl-2-pyrrolidone (NMP). Chemical filtration technologies have aided in minimizing the problems associated with these contam