Zobrazeno 1 - 10
of 187
pro vyhledávání: '"John S. Suehle"'
Publikováno v:
The Journal of Physical Chemistry C. 124:8806-8812
Understanding the electronic structure of organic/molecular semiconductors and the energetics at their interfaces with metals is critical for organic-based electronics applications. Here we demonst...
Autor:
Kin P. Cheung, Richard G. Southwick, John S. Suehle, Jason T. Ryan, A. S. Oates, Jason P. Campbell
Publikováno v:
IEEE Electron Device Letters. :1-1
Charge pumping is one of the most relied techniques used to quantify interface defects in metal-oxide-semiconductor devices. However, conventional charge pumping is easily hindered by excessive gate leakage currents, which render the technique unsuit
Autor:
Hao, Zhu, Haitao, Li, Joseph W F, Robertson, Arvind, Balijepalli, Sergiy, Krylyuk, Albert V, Davydov, John J, Kasianowicz, John S, Suehle, Qiliang, Li
Publikováno v:
Nanotechnology. 28(43)
Novel nanofluidic chemical cells based on self-assembled solid-state SiO
Autor:
Pragya R. Shreshta, John S. Suehle, Kin P. Cheung, Dimitris E. Ioannou, Jason P. Campbell, Z. Chbili
Publikováno v:
Materials Science Forum. :529-532
In this paper we report an unexpected improvement in the SiC DMOSFET transistor characteristics after a long temperature treatment at 150 C. The evolution of the device characteristics during a TDDB stress is compared to that after an elevated temper
Autor:
Kin P. Cheung, Susanne Stemmer, John S. Suehle, Bijesh Rajamohanan, Varistha Chobpattana, Canute Vaz, Suman Datta, David J. Gundlach, Rahul Pandey
Publikováno v:
IEEE Electron Device Letters. 36:20-22
In this letter, we demonstrate using fast current-voltage measurements, low switching slope of 64 mV/decade over a drain current range between $10^{\mathrm {\mathbf {-3}}}$ and $2 \times 10^{\mathrm {\mathbf {-2}}} \mu $ A/ $\mu $ m in staggered-gap
Autor:
Hao Zhu, Hui Yuan, Curt A. Richter, Oleg A. Kirillov, Qiliang Li, John S. Suehle, Dimitris E. Ioannou
Publikováno v:
ECS Transactions. 50:267-271
In this work, we present an experimental study on the effect of metal gates / high-k dielectrics stacks on threshold voltage and carrier mobility in nanowire field effect transistors. The difference between effective mobility and field effect mobilit
Publikováno v:
IEEE Transactions on Electron Devices. 59:2943-2949
Frequency-dependent charge pumping (CP) (FD-CP) has emerged as a popular technique for studying the spatial and energetic distribution of defect centers in advanced high-k gate stacks. However, conflicting interpretations of the CP frequency-defect d
Autor:
John S. Suehle, Tong Ren, John E. Bonevich, Sujitra J. Pookpanratana, Christina A. Hacker, Sean N. Natoli, Curt A. Richter, Hao Zhu, Qiliang Li
Publikováno v:
ACS applied materialsinterfaces. 8(30)
Autor:
Qiliang Li, John E. Bonevich, Curt A. Richter, Christina A. Hacker, Hao Zhu, Sean N. Natoli, Sujitra J. Pookpanratana, John S. Suehle, Tong Ren
Publikováno v:
ACS applied materialsinterfaces. 7(49)
In this work, high-performance top-gated nanowire molecular flash memory has been fabricated with redox-active molecules. Different molecules with one and two redox centers have been tested. The flash memory has clean solid/molecule and dielectric in
Publikováno v:
Thin Solid Films. 519:2811-2816
In this paper, we will provide an overview of the internal photoemission (IPE) and the significance of this technique when combined with spectroscopic ellipsometry (SE) to investigate the interfacial electronic properties of heterostructures. In part