Zobrazeno 1 - 10
of 11
pro vyhledávání: '"John R. Beamish"'
Autor:
Fabien Souris, Andrew D. Fefferman, Humphrey J. Maris, Vincent Dauvois, Philippe Jean-Baptiste, John R. Beamish, Sxe9bastien Balibar
Publikováno v:
Physical Review B - Condensed Matter and Materials Physics.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=erc_________::9ea8aa585feb18054a53288fad20fa29
Publikováno v:
Physical Review Letters.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=erc_________::f8581511f0ad44478ba11bf372e1badd
Publikováno v:
Nanostructured Materials. 1:245-249
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb3d67e047e4344f8b41a46d56c2282c
https://doi.org/10.1016/0965-9773(92)90103-5
https://doi.org/10.1016/0965-9773(92)90103-5
Publikováno v:
Journal of Applied Physics. 68:3015-3017
A series of granular Nix (SiO2)100−x thin films have been prepared by rf sputtering with nickel concentrations between 60 and 90 at. %. The temperature dependence of the resistance is strongly composition dependent. In films with Ni concentrations
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a239a6b90b913642aafabee57bf005a0
https://doi.org/10.1063/1.346410
https://doi.org/10.1063/1.346410
Autor:
Kevin Warner, John R. Beamish
Publikováno v:
Physical review. B, Condensed matter. 50(21)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::59b817452db598efbeb20e7d71a731f0
https://pubmed.ncbi.nlm.nih.gov/9975959
https://pubmed.ncbi.nlm.nih.gov/9975959
Publikováno v:
MRS Proceedings. 195
We have studied the electrical transport behavior of sputter deposited Nix(SiO2)100−x thin films between room temperature and 100 mK and, at selected temperatures, in applied magnetic fields up to 6 T. As the Ni concentration x is reduced, the resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbbd0bb2b756a069207f4b523aead5f7
https://doi.org/10.1557/proc-195-129
https://doi.org/10.1557/proc-195-129
Publikováno v:
MRS Proceedings. 195
The resistivity of sputter deposited Snx (SiO2)100−x films has been measured for Sn concentration x between 50 and 90 atomic percent. Films with more than 53 percent Sn are superconducting at low temperatures with transition temperatures slightly a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5e77008ffb83e0a8318b81937e73bc5
https://doi.org/10.1557/proc-195-385
https://doi.org/10.1557/proc-195-385
Autor:
John R. Beamish, Norbert Mulders
Publikováno v:
Physica B: Condensed Matter. :553-554
The sound speed in porous Vycor glass is strongly dependent on the amount of 4He adsorbed in the pores. This is due to the interaction between the Two-Level Systems (TLS) in the glass and excitations in the helium film. As helium is added, the TLS re
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dfb62070e8dc345c9a04ec1566eb9d8d
https://doi.org/10.1016/s0921-4526(90)81126-9
https://doi.org/10.1016/s0921-4526(90)81126-9
Autor:
Kevin Warner, John R. Beamish
Publikováno v:
Physica B: Condensed Matter. :573-574
We have made ultrasonic measurements of the superfluid density and the dissipation in several porous alumina samples filled with 4 He. In one sample (formed by a sol-gel process) with high porosity (92%) and large pores (R=1600 A), we found that the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4694e82191601753bba792975f491862
https://doi.org/10.1016/s0921-4526(90)81136-c
https://doi.org/10.1016/s0921-4526(90)81136-c
Publikováno v:
Physica B: Condensed Matter. :39-40
We have used RF sputtering to prepare a series of granular Ni x (SiO 2 ) 100− x films with nickel concentrations, x, between 60 and 90 atomic percent. The electrical resistivity of such films depends strongly on composition. We find that films with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8fafee0d7f96e5d28ddf5ab939681a63
https://doi.org/10.1016/s0921-4526(90)80869-k
https://doi.org/10.1016/s0921-4526(90)80869-k