Zobrazeno 1 - 6
of 6
pro vyhledávání: '"John Manfredo"'
Autor:
Vishal Garg, Jason Hickethier, Cris Morgante, John Manfredo, Peter Buck, Curt Jackson, Paul C. Allen, Michael White, Robert Kiefer
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation Deep Ultra-Violet (DUV) Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f68b235c169aff6069230a917974dbf6
https://doi.org/10.1117/12.632227
https://doi.org/10.1117/12.632227
Autor:
Curt Jackson, Cris Morgante, Paul C. Allen, John Manfredo, Peter D. Buck, Robert Kiefer, Vishal Garg, David Mellenthin, Jason Hickethier, Michael White, Sarah Cohen, Eric R. Christenson
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation DUV Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth data-path t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::609ac3c9363e404e611eb2ddf625b124
https://doi.org/10.1117/12.617524
https://doi.org/10.1117/12.617524
Autor:
Vishal Garg, Curt Jackson, John Manfredo, David Mellenthin, Cris Morgante, Sarah Cohen, Robert Kiefer, Michael White, Peter D. Buck, Paul C. Allen
Publikováno v:
Optical Microlithography XVIII.
Currently, the ALTA ® 4300 generation DUV Laser system is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth datapa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1a162ef2a28b7cf8be92ba31ac92da5
https://doi.org/10.1117/12.600368
https://doi.org/10.1117/12.600368
Autor:
John Manfredo, Charles H. Howard, Matt J. Lamantia, James G. Tsou, Jason Hickethier, Robert Kiefer, Vishal Garg, Curt Jackson, Sarah Cohen, Peter D. Buck
Publikováno v:
SPIE Proceedings.
In the recent past Deep Ultra Violet (DUV) Laser generated photomasks have gained widespread acceptance for critical and semi-critical applications in semi-conductor lithography. The advent of stable, highly capable, single-layer Chemically Amplified
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfdc73bd94cdd4ba5678467768473034
https://doi.org/10.1117/12.557720
https://doi.org/10.1117/12.557720
Autor:
Curt A. Jackson, Peter Buck, Sarah Cohen, Vishal Garg, Charles Howard, Robert M. Kiefer, John Manfredo, James Tsou
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::393350dafa9857505b264b3c74401d73
https://doi.org/10.1117/12.534575
https://doi.org/10.1117/12.534575
Autor:
Robert Kiefer, Vishal Garg, Curt Jackson, Sarah Cohen, Peter D. Buck, James G. Tsou, John Manfredo, Charles H. Howard
Publikováno v:
SPIE Proceedings.
In the recent past significant work has been done to isolate and characterize suitable single layer Chemically Amplified Resist (CAR) systems for DUV printing applicable to photomask fabrication. This work is complicated by the inherent instability o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::686d13bddb98d9abb4da297f71feb484
https://doi.org/10.1117/12.518269
https://doi.org/10.1117/12.518269