Zobrazeno 1 - 2
of 2
pro vyhledávání: '"John K. Shugrue"'
Publikováno v:
Applied Physics Letters. 62:699-701
The effect of phosphorous incorporation on the deposition rate of phosphosilicate glass from the reaction of PH3, O2, and tetraethoxysilane (TEOS) has been studied. The previously reported apparent catalytic effect of PH3 on the deposition rate of Si
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a98903697035d1707baa0d930dde0f7c
https://doi.org/10.1063/1.108844
https://doi.org/10.1063/1.108844
Publikováno v:
Journal of The Electrochemical Society. 140:L178-L179
In this letter we present initial results for the anisotropic deposition of doped silicate glass. The deposition was performed in a previously described low pressure chemical vapor deposition reactor by the reaction of tetraethylorthosilicate, trieth
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee0e9e1da4d4140453f56adb24358b5d
https://doi.org/10.1149/1.2221157
https://doi.org/10.1149/1.2221157