Zobrazeno 1 - 8
of 8
pro vyhledávání: '"John Fretwell"'
Autor:
John Fretwell, Haiyan Tan, Chris Hakala, Timothy A. Johnson, Raghaw Rai, Irene Brooks, Chris Kang, Ahmad Katnani, Laurent Dumas, Yinggang Lu, Weihao Weng, Zhenxin Zhong
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Developments in the semiconductor industry are driving the need for new methods to characterize smaller 3D devices in a productive and reproducible way. The automation of sample preparation, TEM imaging, and offline CD metrology is able to provide sa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b91e8d8f026942d1806756a3776c3069
https://doi.org/10.1109/asmc.2018.8373156
https://doi.org/10.1109/asmc.2018.8373156
Autor:
Jack Hager, Laurent Dumas, John Fretwell, Yinggang Lu, Haiyan Tan, Weihao Weng, Anne Kenslea, Chris Kang, Chris Hakala, Zhenxin Zhong, Irene Brooks
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Few existing in-line CD metrology techniques can match the sub-surface 3D analytical capability provided by transmission electron microscopy (TEM). Recent developments in sample preparation and analysis have resulted in a fully automated TEM workflow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::453c2d36e3d85f821b1385b7985d0142
https://doi.org/10.1109/asmc.2018.8373170
https://doi.org/10.1109/asmc.2018.8373170
Autor:
Sidlgata V. Sreenivasan, Scott Carden, Cynthia B. Brooks, Logan Simpson, Dwayne L. LaBrake, John Fretwell, Zhengmao Ye, Paul Hellebrekers, Rick Ramos, Douglas J. Resnick
Publikováno v:
Alternative Lithographic Technologies III.
The Jet and Flash Imprint Lithography (J-FIL ® ) process uses drop dispensing of UV curable resists for high resolution patterning. Several applications, including patterned media, are better, and more economically served by a full substrate pattern
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a678fd99e8563d012757d3c42d889437
https://doi.org/10.1117/12.879932
https://doi.org/10.1117/12.879932
Autor:
Luo Kang, Dwayne L. LaBrake, John Fretwell, Douglas J. Resnick, Zhengmao Ye, Rick Ramos, Sidlgata V. Sreenivasan, Gerard M. Schmid, Steven Ha
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for the replication of nano-scale features. Acceptance of imprint lithography for manufacturing will require a demonstration of defect levels commensurate with cost-effective device prod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f899774b8b93b25352750b1021db9fba
https://doi.org/10.1117/12.866882
https://doi.org/10.1117/12.866882
Autor:
Luo Kang, Kosta Selinidis, Gaddi Haase, Douglas J. Resnick, John Fretwell, Cindy Brooks, Sidlgata V. Sreenivasan, Gerard M. Schmid, Lovejeet Singh, David Curran
Publikováno v:
SPIE Proceedings.
Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Acceptance of imprint lithography for manufacturing will require demonstration that it can attain defect levels commensurate with the requirements
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db4b76fcb45393ea78998d261dcca9a9
https://doi.org/10.1117/12.848391
https://doi.org/10.1117/12.848391
Autor:
Zhengmao Ye, John Fretwell, Douglas J. Resnick, Sidlgata V. Sreenivasan, Dwayne L. LaBrake, Gerard M. Schmid, Luo Kang, Steven Ha
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:C6M7-C6M11
Imprint lithography has been shown to be an effective technique for the replication of nanoscale features. Acceptance of imprint lithography for manufacturing will require a demonstration of defect levels commensurate with cost-effective device produ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::245ab781def3cb6e3a51084e84aaabb6
https://doi.org/10.1116/1.3498752
https://doi.org/10.1116/1.3498752
Autor:
John Fretwell
Publikováno v:
International Affairs. 67:805-806
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5622b930190f159108634cb0d90dabf
https://doi.org/10.2307/2622505
https://doi.org/10.2307/2622505
Autor:
John Fretwell
Publikováno v:
Národní knihovna České republiky.
Externí odkaz:
http://www.manuscriptorium.com/apps/index.php?direct=record&pid=NKCR__-NKCR__T242070ADL084D55741-cs