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pro vyhledávání: '"John D. Boniface"'
Autor:
Pan Yang, Richard A. Gottscho, Thorsten Lill, Keren J. Kanarik, John D. Boniface, Andreas Fischer, Richard Janek, Vahid Vahedi
Publikováno v:
SPIE Proceedings.
In this paper, we report on plasma assisted thermal Atomic Layer Etching (ALE) of Al2O3. The surface was modified via a fluorine containing plasma without bias power. The removal was accomplished by a thermal reaction step using tin-(II) acetylaceton
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbd18e63db1cfd543e81633ab5bc65db
https://doi.org/10.1117/12.2258129
https://doi.org/10.1117/12.2258129
