Zobrazeno 1 - 10
of 90
pro vyhledávání: '"John C Arnold"'
Autor:
John H Powers, Elizabeth D Bacci, Nancy K Leidy, Jiat-Ling Poon, Sonja Stringer, Matthew J Memoli, Alison Han, Mary P Fairchok, Christian Coles, Jackie Owens, Wei-Ju Chen, John C Arnold, Patrick J Danaher, Tahaniyat Lalani, Timothy H Burgess, Eugene V Millar, Michelande Ridore, Andrés Hernández, Patricia Rodríguez-Zulueta, Hilda Ortega-Gallegos, Arturo Galindo-Fraga, Guillermo M Ruiz-Palacios, Sarah Pett, William Fischer, Daniel Gillor, Laura Moreno Macias, Anna DuVal, Richard Rothman, Andrea Dugas, M Lourdes Guerrero
Publikováno v:
PLoS ONE, Vol 13, Iss 3, p e0194180 (2018)
BackgroundThe inFLUenza Patient Reported Outcome (FLU-PRO) measure is a daily diary assessing signs/symptoms of influenza across six body systems: Nose, Throat, Eyes, Chest/Respiratory, Gastrointestinal, Body/Systemic, developed and tested in adults
Externí odkaz:
https://doaj.org/article/3ea813e5c9ba4de2bdb3cdf1841757c6
Autor:
Gabriel N Defang, Nicholas J Martin, Timothy H Burgess, Eugene V Millar, LeNae A Pecenka, Janine R Danko, John C Arnold, Tadeusz J Kochel, Thomas C Luke
Publikováno v:
PLoS ONE, Vol 7, Iss 12, p e48229 (2012)
Influenza-specific hemaggluitination inhibition (HAI) antibody titer, an indicator of immunity to influenza, is often used to measure exposure to influenza in surveillance and immunogenicity studies. Traditionally, serum has been the specimen of choi
Externí odkaz:
https://doaj.org/article/cb7f4b129cfa4a01a587734959370177
Autor:
Nathan Ip, Michael P. Belyansky, Christopher Netzband, Norifumi Kohama, Richard Johnson, Shobha Hosadurga, Jack Wong, John C. Arnold, Kisik Choi, Wai Kin Li, Indira Seshadri, Luciana Meli, Ilseok Son
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab2add2a7aa22fe31fe3d551e8514f40
https://doi.org/10.1117/12.2654679
https://doi.org/10.1117/12.2654679
Autor:
Tahaniyat Lalani, Eugene V. Millar, Christian L. Coles, Michael Rajnik, Rhonda E Colombo, John C. Arnold, Robert Deiss, Christina Schofield, Ryan C. Maves, Patrick Danaher, Wei-Ju Chen, Mary P. Fairchok, Timothy Burgess, Stephanie A Richard
Publikováno v:
Mil Med
Introduction Since the influenza A/H1N1 pandemic of 2009 to 2010, numerous studies have described the clinical course and outcome of the different subtypes of influenza (A/H1N1, A/H3N2, and B). A recent systematic literature review concluded that the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cb246bb92defc9cd38a3a0bf7b13595f
https://doi.org/10.1093/milmed/usaa120
https://doi.org/10.1093/milmed/usaa120
Autor:
Nanda Ramchandar, Rita Stinnett, Vidyadhar V. Upasani, Benjamin Briggs, Kathleen D Rickert, David Dimmock, Lauge Farnaes, George Y. Liu, Andrew T. Pennock, John C. Arnold, John S. Bradley, Maya E. Pring, Christopher R. Cannavino, Nicole G. Coufal, Jessica Burns, Charles Y. Chiu
Publikováno v:
Open forum infectious diseases, vol 8, iss 7
Open Forum Infectious Diseases
Open Forum Infectious Diseases
Background Osteoarticular infections (OAIs) are frequently encountered in children. Treatment may be guided by isolation of a pathogen; however, operative cultures are often negative. Metagenomic next-generation sequencing (mNGS) allows for broad and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::21617a406cbd6fec4578412095e94801
https://escholarship.org/uc/item/13k9s7kd
https://escholarship.org/uc/item/13k9s7kd
Autor:
Wei-Ju Chen, John C. Arnold, Eugene V. Millar, Michelande Ridore, Monique Bouvier, Timothy Burgess, Deepika Mor, Tahaniyat Lalani, Mary P. Fairchok, Patrick Danaher, Leslie Malone
Publikováno v:
Influenza and Other Respiratory Viruses
Human coronavirus (HCoV) is a known cause of influenza-like illness (ILI). In a multisite, observational, longitudinal study of ILI among otherwise healthy adolescents and adults, 12% of subjects were PCR-positive for HCoV. The distribution of specie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::47f402045218a071ce9e6cd69f399fdf
Autor:
Connie Trieu, Alejandro Jordan Villegas, Asim A. Ahmed, Carolina Sanchez-Vegas, P Marcelo Laufer, John C. Arnold, Adriana Sarmiento, Martin S. Lindner, Ana Del Valle Penella, Manuel R Cotilla
Publikováno v:
Journal of the Pediatric Infectious Diseases Society. 10:S10-S10
Background Kingella kingae is a recognized cause of bone and joint infections (BJI) in infants. The diagnosis of Kingella kingae BJI can be challenging due to its fastidious growth with conventional culturing methods even when infected tissue is obta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d992936d4c5373242c5e7c463763d0b
https://doi.org/10.1093/jpids/piaa170.030
https://doi.org/10.1093/jpids/piaa170.030
Autor:
Catherine B. Labelle, Bhaskar Nagabhirava, Andre Labonte, Xun Xiang, Stefan Schmitz, Genevieve Beique, Michael Goss, Phil Friddle, Lei Sun, Dominik Metzler, John C. Arnold
Publikováno v:
Advanced Etch Technology for Nanopatterning VII.
The thin nature of EUV (Extreme Ultraviolet) resist has posed significant challenges for etch processes. In particular, EUV patterning combined with conventional etch approaches suffers from loss of pattern fidelity in the form of line breaks. A typi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f1cc23cf3bbc0ccbd929bec81f3e4ef
https://doi.org/10.1117/12.2297413
https://doi.org/10.1117/12.2297413
Autor:
Andrew Metz, Jeffrey Smith, Peter Biolsi, Akiteru Ko, Jeffrey C. Shearer, Anton J. deVilliers, Xinghua Sun, Yongan Xu, John C. Arnold, Angelique Raley, Nelson Felix, Joe Lee, Richard A. Farrell
Publikováno v:
Advanced Etch Technology for Nanopatterning VII.
We report a sub-30-nm pitch self-aligned double patterning (SADP) integration scheme with EUV lithography coupled with self-aligned block technology targeting the back end of line metal line patterning applications for logic nodes beyond 5 nm. The in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3f87b085c99029d6f80034b991673fbe
https://doi.org/10.1117/12.2297438
https://doi.org/10.1117/12.2297438
Defect detection strategies and process partitioning for SE EUV patterning (Conference Presentation)
Autor:
Nelson Felix, Barry Saville, Corey Lemley, Bassem Hamieh, Christopher F. Robinson, Shinichiro Kawakami, Jeffrey C. Shearer, Chet Lenox, Yann Mignot, Takeshi Shimoaoki, Eric Liu, Hiroshi Ichinomiya, Koichiro Tanaka, Ankit Jain, Koichi Hontake, Shravan Matham, Heungsoo Choi, John C. Arnold, Luciana Meli, Anuja De Silva, Benjamin D. Briggs, Ko Akiteru, Hashimoto Yusaku, Lior Huli, Akiko Kai, Dave Hetzer, Karen Petrillo
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
The key challenge for enablement of a 2nd node of single-expose EUV patterning is understanding and mitigating the patterning-related defects that narrow the process window. Typical in-line inspection techniques, such as broadband plasma (291x) and e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90ac805d2ce705c9b9f7b4ac04d3dfcc
https://doi.org/10.1117/12.2297362
https://doi.org/10.1117/12.2297362