Deep-UV-Lithography: Principles, Optimization, and Simulation

Autor: Keil, Matthias, Møller, Niels Peder, Khomtchenko, Elena, Johansen, Leif Steen

Publikováno v: Keil, M, Møller, N P, Khomtchenko, E & Johansen, L S 2015, Deep-UV-Lithography: Principles, Optimization, and Simulation . in Book of Abstracts. DTU's Sustain Conference 2015 ., P-9, Technical University of Denmark, Lyngby, DTU Sustain Conference 2015, Lyngby, Denmark, 17/12/2015 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od______1202::69388101e0608743b9aaa88d6b92adc2
https://orbit.dtu.dk/en/publications/deepuvlithography-principles-optimization-and-simulation(fd5c05a2-e542-40b3-bb6d-19062d49fe58).html